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Rf sputtered Na0.5K...
Rf sputtered Na0.5K0.5NbO3 films on oxide substrates as optical waveguiding material
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- Blomqvist, Mats (author)
- KTH,Mikroelektronik och informationsteknik, IMIT
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- Khartsev, Sergiy (author)
- KTH,Mikroelektronik och informationsteknik, IMIT
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- Grishin, Alexander M. (author)
- KTH,Mikroelektronik och informationsteknik, IMIT
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- Petraru, Adrian (author)
- Institute of Thin Films and Interfaces, Section: Ion Technology, Forschungzentrum Jülich
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(creator_code:org_t)
- Informa UK Limited, 2003
- 2003
- English.
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In: Integrated Ferroelectrics. - : Informa UK Limited. - 1058-4587 .- 1607-8489. ; 54, s. 631-640
- Related links:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Subject headings
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- Highly crystalline Na0.5K0.5NbO3 (NKN) thin films of 1-2 mum thickness were deposited by rf-magnetron sputtering of a stoichiometric, ceramic target on single crystal LaAlO3 (001) and Al2O3 (01 (1) under bar2) substrates. X-ray diffraction measurements revealed epitaxial quality of NKN/LaAlO3 film structures, whereas NKN films on sapphire substrates were found to be preferentially c -axis oriented. A prism-coupling technique was used to characterize optical and waveguiding properties. A bright-line spectrum at lambda = 632.8 nm, revealed sharp peaks, corresponding to transverse magnetic (TM) and electric (TE) waveguide propagation modes in NKN/LaAlO3 and NKN/Al2O3 thin films. Using a least mean square fit the refractive index for the films and film thickness were calculated. The extraordinary and ordinary refractive indices were determined to n(e) = 2.207 +/- 0.002 and n(o) = 2.261 +/- 0.002, and n(e) = 2.216 +/- 0.002 and n(o) = 2.247 +/- 0.002 at lambda = 632.8 nm for 2.0 mum thick NKN films on LaAlO3 and Al2O3 , respectively. This corresponds to a birefringence Deltan = n(e) - n(o) = -0.054 +/- 0.003 and Deltan = -0.031 +/- 0.003 in the films, where the larger Deltan for the NKN/LaAlO3 structure can be explained by the superior crystalline quality compared to NKN/Al2O3 . Atomic force microscopy images of the film surfaces revealed rms roughnesses of 2.5 nm and 8.0 nm for 1.0-mum thick NKN/LaAlO3 and NKN/Al2O3 films, respectively. We believe surface scattering is one of the main sources of waveguide losses in the thin films.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Materialteknik -- Annan materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering -- Other Materials Engineering (hsv//eng)
Keyword
- Na0.5K0.5NbO3 films
- rf-magnetron sputtering
- prism coupling
- waveguiding
- refractive index
- knbo3 thin-films
- sapphire
- light
- Functional materials
- Funktionella material
Publication and Content Type
- ref (subject category)
- art (subject category)
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