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Rf sputtered Na0.5K0.5NbO3 films on oxide substrates as optical waveguiding material

Blomqvist, Mats (author)
KTH,Mikroelektronik och informationsteknik, IMIT
Khartsev, Sergiy (author)
KTH,Mikroelektronik och informationsteknik, IMIT
Grishin, Alexander M. (author)
KTH,Mikroelektronik och informationsteknik, IMIT
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Petraru, Adrian (author)
Institute of Thin Films and Interfaces, Section: Ion Technology, Forschungzentrum Jülich
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 (creator_code:org_t)
Informa UK Limited, 2003
2003
English.
In: Integrated Ferroelectrics. - : Informa UK Limited. - 1058-4587 .- 1607-8489. ; 54, s. 631-640
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • Highly crystalline Na0.5K0.5NbO3 (NKN) thin films of 1-2 mum thickness were deposited by rf-magnetron sputtering of a stoichiometric, ceramic target on single crystal LaAlO3 (001) and Al2O3 (01 (1) under bar2) substrates. X-ray diffraction measurements revealed epitaxial quality of NKN/LaAlO3 film structures, whereas NKN films on sapphire substrates were found to be preferentially c -axis oriented. A prism-coupling technique was used to characterize optical and waveguiding properties. A bright-line spectrum at lambda = 632.8 nm, revealed sharp peaks, corresponding to transverse magnetic (TM) and electric (TE) waveguide propagation modes in NKN/LaAlO3 and NKN/Al2O3 thin films. Using a least mean square fit the refractive index for the films and film thickness were calculated. The extraordinary and ordinary refractive indices were determined to n(e) = 2.207 +/- 0.002 and n(o) = 2.261 +/- 0.002, and n(e) = 2.216 +/- 0.002 and n(o) = 2.247 +/- 0.002 at lambda = 632.8 nm for 2.0 mum thick NKN films on LaAlO3 and Al2O3 , respectively. This corresponds to a birefringence Deltan = n(e) - n(o) = -0.054 +/- 0.003 and Deltan = -0.031 +/- 0.003 in the films, where the larger Deltan for the NKN/LaAlO3 structure can be explained by the superior crystalline quality compared to NKN/Al2O3 . Atomic force microscopy images of the film surfaces revealed rms roughnesses of 2.5 nm and 8.0 nm for 1.0-mum thick NKN/LaAlO3 and NKN/Al2O3 films, respectively. We believe surface scattering is one of the main sources of waveguide losses in the thin films.

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Materialteknik -- Annan materialteknik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Materials Engineering -- Other Materials Engineering (hsv//eng)

Keyword

Na0.5K0.5NbO3 films
rf-magnetron sputtering
prism coupling
waveguiding
refractive index
knbo3 thin-films
sapphire
light
Functional materials
Funktionella material

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ref (subject category)
art (subject category)

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Blomqvist, Mats
Khartsev, Sergiy
Grishin, Alexand ...
Petraru, Adrian
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ENGINEERING AND TECHNOLOGY
ENGINEERING AND ...
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Integrated Ferro ...
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Royal Institute of Technology

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