Modeling the high power impulse magnetron sputtering discharge

Minea, T. (author)

Kozák, T. (author)

Costin, C. (author)

Lundin, D. (author)

(creator_code:org_t)

Elsevier, 2019
2019
English.
In: High Power Impulse Magnetron Sputtering. - : Elsevier. - 9780128124543 - 9780128124550 ; , s. 159-221

Related links:: https://urn.kb.se/re...; show more...; https://doi.org/10.1...; show less...

Abstract Subject headings

Modeling has the possibility to capture the main interacting mechanisms in a plasma discharge, which are typically very difficult to identify (isolate) in experiments. A large variety of computer models describing the plasma behavior in HiPIMS discharges have been developed and used to gain insight into various physical and chemical mechanisms operating in these discharges. In this chapter we give an extended overview and, when possible, a comparison of the theoretical and numerical methods used to tackle the different challenges encountered in HiPIMS discharges, from the cathode through the ionization region, the diffusion region, and, finally, to the substrate and chamber walls. We also highlight some important modeling results, which have been selected to emphasize the added understanding brought by computational modeling, but also to validate certain model approaches, or highlight model-specific results.

By the author/editor: Minea, T.; Kozák, T.; Costin, C.; Gudmundsson, Jon ...; Lundin, D.

About the subject

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