onr:"swepub:oai:DiVA.org:kth-309431"
Search: onr:"swepub:oai:DiVA.org:kth-309431" > Dynamics of bipolar...
- 1 of 1
- Previous record
- Next record
- To hitlist
- Zanaska, MichalLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten (author)
Dynamics of bipolar HiPIMS discharges by plasma potential probe measurements
- Article/chapterEnglish2022
Publisher, publication year, extent ...
- 2022-02-15
- IOP Publishing,2022
- printrdacarrier
Numbers
- LIBRIS-ID:oai:DiVA.org:kth-309431
- https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-309431URI
- https://doi.org/10.1088/1361-6595/ac4b65DOI
- https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-183436URI
Supplementary language notes
- Language:English
- Summary in:English
Part of subdatabase
- SwePubSwePub
Classification
Notes
- QC 20220307
- Funding Agencies|Swedish Research CouncilSwedish Research CouncilEuropean Commission [VR 2018-04139]; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University (Faculty Grant SFOMat-LiU) [2009-00971]; Eurostars program (IonDrive) [E!114277]; Ministry of Education Youth and Sports of Czech RepublicMinistry of Education, Youth & Sports - Czech Republic [LM2018097]; Czech Science FoundationGrant Agency of the Czech Republic [GA19-00579S]; National Natural Science Foundation of ChinaNational Natural Science Foundation of China (NSFC) [51805102, 52165021]
- The plasma potential at a typical substrate position is studied during the positive pulse of a bipolar high-power impulse magnetron sputtering (bipolar HiPIMS) discharge with a Cu target. The goal of the study is to identify suitable conditions for achieving ion acceleration independent on substrate grounding. We find that the time-evolution of the plasma potential during the positive pulse can be separated into several distinct phases, which are highly dependent on the discharge conditions. This includes exploring the influence of the working gas pressure (0.3-2 Pa), HiPIMS peak current (10-70 A corresponding to 0.5-3.5 A cm(-2)), HiPIMS pulse length (5-60 mu s) and the amplitude of the positive voltage U (+) applied during the positive pulse (0-150 V). At low enough pressure, high enough HiPIMS peak current and long enough HiPIMS pulse length, the plasma potential at a typical substrate position is seen to be close to 0 V for a certain time interval (denoted phase B) during the positive pulse. At the same time, spatial mapping of the plasma potential inside the magnetic trap region revealed an elevated value of the plasma potential during phase B. These two plasma potential characteristics are identified as suitable for achieving ion acceleration in the target region. Moreover, by investigating the target current and ion saturation current at the chamber walls, we describe a simple theory linking the value of the plasma potential profile to the ratio of the available target electron current and ion saturation current at the wall.
Subject headings and genre
- NATURVETENSKAP Fysik Fusion, plasma och rymdfysik hsv//swe
- NATURAL SCIENCES Physical Sciences Fusion, Plasma and Space Physics hsv//eng
- high-power impulse magnetron sputtering
- bipolar HiPIMS
- plasma potential
- ion acceleration
Added entries (persons, corporate bodies, meetings, titles ...)
- Lundin, DanielLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten(Swepub:liu)danlu03 (author)
- Brenning, NilsKTH,Rymd- och plasmafysik,KTH Royal Inst Technol, Sweden(Swepub:kth)u1w9mcft (author)
- Du, HaoLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten,Guizhou Univ, Peoples R China(Swepub:liu)haodu39 (author)
- Dvorak, PavelMasaryk Univ, Fac Sci, Dept Phys Elect, Kotlarska 2, CZ-61137 Brno, Czech Republic. (author)
- Vasina, PetrMasaryk Univ, Fac Sci, Dept Phys Elect, Kotlarska 2, CZ-61137 Brno, Czech Republic. (author)
- Helmersson, UlfLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten(Swepub:liu)ulfhe30 (author)
- Linköpings universitetPlasma och ytbeläggningsfysik (creator_code:org_t)
Related titles
- In:Plasma sources science & technology: IOP Publishing31:2, s. 025007-0963-02521361-6595
Internet link
Find in a library
- Plasma sources science & technology (Search for host publication in LIBRIS)
To the university's database
- 1 of 1
- Previous record
- Next record
- To hitlist
Find more in SwePub
- By the author/editor
- Zanaska, Michal
- Lundin, Daniel
- Brenning, Nils
- Du, Hao
- Dvorak, Pavel
- Vasina, Petr
- show more...
- Helmersson, Ulf
- show less...
- About the subject
-
- NATURAL SCIENCES
- NATURAL SCIENCES
- and Physical Science ...
- and Fusion Plasma an ...
- Articles in the publication
- Plasma sources s ...
- By the university
- Royal Institute of Technology
- Linköping University
Search outside SwePub
- Extend your search to:
- Google Book Search
- Google Scholar
Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.
- Copyright © LIBRIS - National Library Systems
- LIBRIS.kb.se
