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Operating modes and...
Operating modes and target erosion in high power impulse magnetron sputtering
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- Rudolph, M. (author)
- Leibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany.
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- Brenning, Nils (author)
- Linköpings universitet,KTH,Rymd- och plasmafysik,Linköping Univ, Plasma & Coatings Phys Div, IFM Mat Phys, SE-58183 Linköping, Sweden.,Plasma och ytbeläggningsfysik,Tekniska fakulteten,KTH Royal Inst Technol, Sweden
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- Hajihoseini, H. (author)
- Univ Twente, MESA Inst Nanotechnol, Ind Focus Grp XUV Opt, Drienerlolaan 5, NL-7522 NB Enschede, Netherlands.
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- Raadu, Michael A. (author)
- KTH,Rymd- och plasmafysik,KTH Royal Inst Technol, Sweden
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- Fischer, Joel (author)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten
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- Gudmundsson, Jon Tomas, 1965- (author)
- KTH,Rymd- och plasmafysik,Univ Iceland, Sci Inst, Dunhaga 3, IS-107 Reykjavik, Iceland.,KTH Royal Inst Technol, Sweden; Univ Iceland, Iceland
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- Lundin, Daniel (author)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten
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Leibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany Rymd- och plasmafysik (creator_code:org_t)
- American Vacuum Society, 2022
- 2022
- English.
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In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - : American Vacuum Society. - 0734-2101 .- 1520-8559. ; 40:4, s. 043005-
- Related links:
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https://liu.diva-por... (primary) (Raw object)
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Subject headings
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- Magnetron sputtering combines a glow discharge with sputtering from a target that simultaneously serves as a cathode for the discharge. The electrons of the discharge are confined between overarching magnetic field lines and the negatively biased cathode. As the target erodes during the sputter process, the magnetic field strengthens in the cathode vicinity, which can influence discharge parameters with the risk of impairing reproducibility of the deposition process over time. This is of particular concern for high-power impulse magnetron sputtering (HiPIMS) as the discharge current and voltage waveforms vary strongly with the magnetic field strength. We here discuss ways to limit the detrimental effect of target erosion on the film deposition process by choosing an appropriate mode of operation for the discharge. The goal is to limit variations of two principal flux parameters, the deposition rate and the ionized flux fraction. As an outcome of the discussion, we recommend operating HiPIMS discharges by maintaining the peak discharge current constant.
Subject headings
- NATURVETENSKAP -- Fysik -- Fusion, plasma och rymdfysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Fusion, Plasma and Space Physics (hsv//eng)
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
Publication and Content Type
- ref (subject category)
- art (subject category)
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