SwePub
Sök i LIBRIS databas

  Extended search

onr:"swepub:oai:DiVA.org:kth-341962"
 

Search: onr:"swepub:oai:DiVA.org:kth-341962" > Insights into the c...

  • 1 of 1
  • Previous record
  • Next record
  •    To hitlist

Insights into the copper HiPIMS discharge : deposition rate and ionised flux fraction

Fischer, Joel (author)
Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten,Evatec AG, Switzerland
Renner, Max (author)
Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten
Gudmundsson, Jon Tomas, 1965- (author)
KTH,Rymd- och plasmafysik,Science Institute, University of Iceland, Dunhaga 3, Reykjavik IS-107,KTHRoyal Inst Technol, Sweden; Univ Iceland, Iceland
show more...
Rudolph, M. (author)
Leibniz Institute of Surface Engineering (IOM), Permoserstraße 15, Leipzig DE-04318, Germany,Leibniz Inst Surface Engn IOM, Germany
Hajihoseini, H. (author)
Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, Enschede 7522 NB, The Netherlands,Univ Twente, Netherlands
Brenning, Nils (author)
Linköpings universitet,KTH,Rymd- och plasmafysik,Plasma and Coatings Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping SE-581 83, Sweden,Plasma och ytbeläggningsfysik,Tekniska fakulteten,KTHRoyal Inst Technol, Sweden
Lundin, Daniel (author)
Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten
show less...
 (creator_code:org_t)
IOP Publishing, 2023
2023
English.
In: Plasma sources science & technology. - : IOP Publishing. - 0963-0252 .- 1361-6595. ; 32:12
  • Journal article (peer-reviewed)
Abstract Subject headings
Close  
  • The influence of pulse length, working gas pressure, and peak discharge current density on the deposition rate and ionised flux fraction in high power impulse magnetron sputtering discharges of copper is investigated experimentally using a charge-selective (electrically biasable) magnetically shielded quartz crystal microbalance (or ionmeter). The large explored parameter space covers both common process conditions and extreme cases. The measured ionised flux fraction for copper is found to be in the range from ≈10% to 80%, and to increase with increasing peak discharge current density up to a maximum at ≈ 1.25 A cm − 2 , before abruptly falling off at even higher current density values. Low working gas pressure is shown to be beneficial in terms of both ionised flux fraction and deposition rate fraction. For example, decreasing the working gas pressure from 1.0 Pa to 0.5 Pa leads on average to an increase of the ionised flux fraction by ≈ 14 percentage points (pp) and of the deposition rate fraction by ≈ 4 pp taking into account all the investigated pulse lengths.

Subject headings

NATURVETENSKAP  -- Fysik -- Fusion, plasma och rymdfysik (hsv//swe)
NATURAL SCIENCES  -- Physical Sciences -- Fusion, Plasma and Space Physics (hsv//eng)

Keyword

copper
HiPIMS
process development

Publication and Content Type

ref (subject category)
art (subject category)

Find in a library

To the university's database

  • 1 of 1
  • Previous record
  • Next record
  •    To hitlist

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.

 
pil uppåt Close

Copy and save the link in order to return to this view