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Heteroepitaxy and selective epitaxy for discrete and integrated devices
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- Lourdudoss, Sebastian (author)
- KTH,Mikroelektronik och Informationsteknik, IMIT,Electrumlaboratoriet, ELAB
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- Olsson, Fredrik (author)
- KTH,Electrumlaboratoriet, ELAB
- Barrios, C. A. (author)
- show more...
- Broeke, R. G. (author)
- Cao, J. (author)
- Chubun, N. (author)
- Seo, S. -W (author)
- Baek, J. -H (author)
- Aihara, K. (author)
- Pharn, Anh-Vu (author)
- Ben Yoo, S. J. (author)
- Avella, M. (author)
- Jimenez, J. (author)
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- (creator_code:org_t)
- NEW YORK : IEEE, 2006
- 2006
- English.
- In: 2006 CONFERENCE ON OPTOELECTRONIC AND MICROELECTRONIC MATERIALS & DEVICES. - NEW YORK : IEEE. - 9781424405770 ; , s. 309-311
- Conference paper (peer-reviewed)
Abstract
Subject headings
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- We present first results on heteroepitaxy of InP on silicon on insulator (SOI). We also demonstrate InP nanopillar fabrication by means of selective epitaxy. Selective epitaxy is also exploited to fabricate advanced photonic integrated devices for Optical Code Division Multiplex Access (OCDMA) networking applications.
Subject headings
- NATURVETENSKAP -- Fysik -- Atom- och molekylfysik och optik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Atom and Molecular Physics and Optics (hsv//eng)
Keyword
- heteroepitaxy
- selective epitaxy
- nanopillars
- hydride vapour phase epitaxy
- OCDAM devices
Publication and Content Type
- ref (subject category)
- kon (subject category)
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- Aubert, Amandine
- Berggren, Jesper
- Broeke, R. G.
- Cao, J.
- Chubun, N.
- Seo, S. -W
- Baek, J. -H
- Aihara, K.
- Pharn, Anh-Vu
- Ben Yoo, S. J.
- Avella, M.
- Jimenez, J.
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