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Mobility in graphene double gate field effect transistors

Lemme, Max C., 1970- (author)
AMO GmbH, AMICA, Aachen, Germany
Echtermeyer, T. J. (author)
Baus, M. (author)
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Szafranek, B. N. (author)
Bolten, J. (author)
Schmidt, M. (author)
Wahlbrink, T. (author)
Kurz, H. (author)
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 (creator_code:org_t)
PERGAMON-ELSEVIER SCIENCE LTD, 2008
2008
English.
In: Solid-State Electronics. - : PERGAMON-ELSEVIER SCIENCE LTD. - 0038-1101 .- 1879-2405. ; 52:4, s. 514-518
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • In this work, double-gated field effect transistors manufactured from monolayer graphene are investigated. Conventional top-down CMOS-compatible processes are applied except for graphene deposition by manual exfoliation. Carrier mobilities in single- and double-gated graphene field effect transistors are compared. Even in double-gated graphene FETs, the carrier mobility exceeds the universal mobility of silicon over nearly the entire measured range. At comparable dimensions, reported mobilities for ultra-thin body silicon-on-insulator MOSFETs cannot compete with graphene FET values. (c) 2007 Elsevier Ltd. All rights reserved.

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Nanoteknik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Nano-technology (hsv//eng)

Keyword

graphene
field effect transistor
mobility
SOI

Publication and Content Type

ref (subject category)
art (subject category)

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