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Electrical characte...
Electrical characterization of 12 nm EJ-MOSFETs on SOI substrates
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Henschel, W (author)
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Wahlbrink, T (author)
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Georgiev, Y M (author)
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- Lemme, Max C., 1970- (author)
- AMO GmbH, AMICA, Aachen, Germany
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Mollenhauer, T (author)
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Vratzov, B (author)
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Fuchs, A (author)
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Kurz, H (author)
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Kittler, M (author)
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Schwierz, F (author)
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(creator_code:org_t)
- Elsevier BV, 2004
- 2004
- English.
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In: Solid-State Electronics. - : Elsevier BV. - 0038-1101 .- 1879-2405. ; 48:5, s. 739-745
- Related links:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Subject headings
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- A dual gate metal oxide semiconductor field effect transistor (MOSFET) with electrically variable shallow junctions (EJ-MOSFET) has been fabricated on silicon on insulator (SOI) substrates. This kind of transistor allows testing the limits of scalability at relaxed process requirements. Transistor gate lengths down to 12 run have been structured by electron beam lithography (EBL) and specific etching processes. The coupling of the upper gate to the inner transistor is carefully investigated.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Nanoteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Nano-technology (hsv//eng)
Keyword
- EJ-MOSFET
- 12 nm gate length
- shallow junction
- SOI
- HSQ
- electron beam lithography
Publication and Content Type
- ref (subject category)
- art (subject category)
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- By the author/editor
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Henschel, W
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Wahlbrink, T
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Georgiev, Y M
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Lemme, Max C., 1 ...
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Mollenhauer, T
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Vratzov, B
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show more...
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Fuchs, A
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Kurz, H
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Kittler, M
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Schwierz, F
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show less...
- About the subject
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Nano technology
- Articles in the publication
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Solid-State Elec ...
- By the university
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Royal Institute of Technology