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High-k-oxide/silico...
High-k-oxide/silicon interfaces characterized by capacitance frequency spectroscopy
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- Raeissi, Bahman, 1979 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Piscator, Johan, 1977 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Engström, Olof, 1943 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Hall, S. (author)
- University of Liverpool
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- Buiu, O. (author)
- University of Liverpool
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- Lemme, Max C., 1970- (author)
- AMO GmbH, AMICA, Aachen, Germany
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Gottlob, H. D. B. (author)
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- Hurley, P. K. (author)
- Tyndall National Institute at National University of Ireland, Cork
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- Cherkaoui, K. (author)
- Tyndall National Institute at National University of Ireland, Cork
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- Osten, H. J. (author)
- University of Hanover, Germany
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(creator_code:org_t)
- ISBN 9781424411238
- 2007
- 2007
- English.
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In: ESSDERC 2007. - 9781424411238 ; , s. 283-286
- Related links:
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http://dx.doi.org/10...
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Subject headings
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- Electron capture into insulator/silicon interface states is investigated for high-k dielectrics of Gd(2)O(3) prepared by MBE and ALD, and for HfO(2) prepared by reactive sputtering, by measuring the frequency dependence of MOS capacitance. The capture cross sections are found to be thermally activated and to increase steeply with the energy depth of the interface electron states. The methodology adopted is considered useful for increasing the understanding of high-k-oxide/silicon interfaces.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Nanoteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Nano-technology (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Annan teknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Other Engineering and Technologies (hsv//eng)
Publication and Content Type
- ref (subject category)
- kon (subject category)
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- By the author/editor
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Raeissi, Bahman, ...
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Piscator, Johan, ...
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Engström, Olof, ...
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Hall, S.
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Buiu, O.
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Lemme, Max C., 1 ...
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show more...
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Gottlob, H. D. B ...
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Hurley, P. K.
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Cherkaoui, K.
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Osten, H. J.
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show less...
- About the subject
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Nano technology
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Other Engineerin ...
- Articles in the publication
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ESSDERC 2007
- By the university
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Royal Institute of Technology
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Chalmers University of Technology