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Phase tailoring of ...
Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering
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- Alami, Jones (author)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska högskolan
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- Eklund, Per (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Andersson, Jon M. (author)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska högskolan
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- Lattemann, Martina (author)
- Linköpings universitet,Institutionen för fysik, kemi och biologi,Tekniska högskolan
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- Wallin, Erik (author)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska högskolan
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- Böhlmark, Johan (author)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska högskolan
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- Persson, Per (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Helmersson, Ulf (author)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska högskolan
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(creator_code:org_t)
- Elsevier, 2007
- 2007
- English.
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In: Thin Solid Films. - : Elsevier. - 0040-6090 .- 1879-2731. ; 515:7-8, s. 3434-3438
- Related links:
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http://urn.kb.se/res...
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https://liu.diva-por... (primary) (Raw object)
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Subject headings
Close
- Ta thin films were grown on Si substrates at different inclination angles with respect to the sputter source using high power impulse magnetron sputtering (HIPIMS), an ionized physical vapor deposition technique. The ionization allowed for better control of the energy and directionality of the sputtered species, and consequently for improved properties of the deposited films. Depositions were made on Si substrates with the native oxide intact. The structure of the as deposited films was investigated using X-ray diffraction, while a four-point probe setup was used to measure the resistivity. A substrate bias process-window for growth of bcc-Ta was observed. However, the process-window position changed with changing inclination angles of the substrate. The formation of this low-resistivity bcc-phase could be understood in light of the high ion flux from the HIPIMS discharge.
Subject headings
- NATURVETENSKAP -- Fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences (hsv//eng)
Keyword
- HPPMS
- Ionized PVD
- IPVD
- Pulsed sputtering
- Physics
- Fysik
Publication and Content Type
- ref (subject category)
- art (subject category)
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