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Effect of synchroni...
Effect of synchronized bias in the deposition of TiB2 thin films using high power impulse magnetron sputtering
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- Nedfors, Nils (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Vozniy, Oleksiy (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Rosén, Johanna (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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(creator_code:org_t)
- A V S AMER INST PHYSICS, 2018
- 2018
- English.
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In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - : A V S AMER INST PHYSICS. - 0734-2101 .- 1520-8559. ; 36:3
- Related links:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
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- Titanium diboride thin films have been deposited from a compound TiB2 target on Si(001) substrates at a temperature of 500 degrees C using high power impulse magnetron sputtering (HiPIMS) at a frequency of 1000 Hz and pulse lengths of 20 and 40 mu s. A -60V bias pulse of different pulse length was applied at different time delay relative to the HiPIMS pulse. The average energy per deposited species, amp;lt; E-D amp;gt; = E-i(J(i)/J(t)), where E-i is the average ion energy and J(i)/J(t) is the ratio of the ion bombarding flux to the total flux of deposited species, is strongly dependent on bias mode. A change in preferred orientation from (101) to (001) is observed when amp;lt; E-D amp;gt; increase above 50 eV. The limited adatom mobility at amp;lt; E-D amp;gt; below 50 eV promote growth of fast growing planes resulting in a (101) texture, while amp;lt; E-D amp;gt; above 50 eV supply sufficient energy for development of the thermodynamically more favorable (001) texture. A linear increase in compressive residual stress with the increase in amp;lt; E-D amp;gt; is also found, due to more intensive Ar+ ion bombardment. Analysis of charge-state-resolved plasma chemistry and ion energy shows that the total flux of bombarding ions contains a higher fraction of B+ when the bias is applied in synchronous with the HiPIMS pulse instead of after, resulting in a lower residual stress at similar values of amp;lt; E-D amp;gt; (cf. -2.0 +/- 0.2 and -2.6 +/- 0.1 GPa). This study shows that use of a bias synchronized in different modes relative to the HiPIMS pulse, can be used as a tool to control amp;lt; E-D amp;gt; and to some extent the type of bombarding species, and hence the microstructure of TiB2 thin films. Published by the AVS.
Subject headings
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
Publication and Content Type
- ref (subject category)
- art (subject category)
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