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Epitaxial growth of...
Epitaxial growth of Al-Cr-N thin films on MgO(111)
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- Willmann, Herbert (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Beckers, Manfred (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Birch, Jens (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Mayrhofer, P.H. (author)
- Department of Physical Metallurgy and Materials Testing, University of Leoben
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- Mitterer, C. (author)
- University of Leoben
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- Hultman, Lars (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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(creator_code:org_t)
- Elsevier BV, 2008
- 2008
- English.
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In: Thin Solid Films. - : Elsevier BV. - 0040-6090 .- 1879-2731. ; 517:2, s. 598-602
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Abstract
Subject headings
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- Cubic rock salt structure Al0.60Cr0.40N and Al0.68Cr0.32N films of different thicknesses were grown epitaxially onto MgO(111) substrates by reactive unbalanced magnetron sputtering at 500°C. Rutherford backscattering spectroscopy reveals stoichiometric nitrides with Al/Cr ratios close to the ones of the used compound targets of 60/40 and 70/30. High resolution x-ray diffraction proves epitaxial growth over the whole film thickness up to thicknesses of ~1.8 µm. Reciprocal space maps and selected area electron diffraction show that the AlxCr1-xN films grow fully relaxed. Scanning and transmission electron microscopy imaging reveals columnar microstructures with column widths between 12–16 nm and {001} surface faceting on individual columns. The fully relaxed growth and the columnar structure can be attributed to limited ad‑atom mobility on the initial AlxCr1-xN(111) growth surface.
Keyword
- AlCrN
- CrAlN
- Coherence length
- Mosaicity
- Wurtzite structure
- Epitaxy
Publication and Content Type
- ref (subject category)
- art (subject category)
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