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  • Kilic, UfukUniv Nebraska, NE 68588 USA (author)

Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques

  • Article/chapterEnglish2018

Publisher, publication year, extent ...

  • AMER INST PHYSICS,2018
  • printrdacarrier

Numbers

  • LIBRIS-ID:oai:DiVA.org:liu-151944
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-151944URI
  • https://doi.org/10.1063/1.5038746DOI

Supplementary language notes

  • Language:English
  • Summary in:English

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  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

Notes

  • Funding Agencies|National Science Foundation (NSF) through the Center for Nanohybrid Functional Materials [EPS-1004094]; Nebraska Materials Research Science and Engineering Center (MRSEC) [DMR-1420645]; University of Nebraska-Lincoln; J. A. Woollam Co., Inc.; J. A. Woollam Foundation; [CMMI 1337856]; [EAR 1521428]
  • WO3 thin films were grown by atomic layer deposition and spectroscopic ellipsometry data gathered in the photon energy range of 0.72-8.5 eV, and from multiple samples were utilized to determine the frequency dependent complex-valued isotropic dielectric function for WO3. We employ a critical-point model dielectric function analysis and determine a parameterized set of oscillators and compare the observed critical-point contributions with the vertical transition energy distribution found within the band structure of WO3 calculated by the density functional theory. The surface roughness was investigated using atomic force microscopy, and compared with the effective roughness as seen by the spectroscopic ellipsometry. Published by AIP Publishing.

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Added entries (persons, corporate bodies, meetings, titles ...)

  • Sekora, DerekUniv Nebraska, NE 68588 USA (author)
  • Mock, AlyssaUniv Nebraska, NE 68588 USA (author)
  • Korlacki, RafalUniv Nebraska, NE 68588 USA (author)
  • Valloppilly, ShahUniv Nebraska, NE 68588 USA (author)
  • Echeverria, Elena M.Univ Nebraska, NE 68588 USA (author)
  • Ianno, NataleUniv Nebraska, NE 68588 USA (author)
  • Schubert, EvaUniv Nebraska, NE 68588 USA (author)
  • Schubert, MathiasLinköpings universitet,Halvledarmaterial,Tekniska fakulteten,Univ Nebraska, NE 68588 USA; Leibniz Inst Polymer Res Dresden, Germany(Swepub:liu)schma39 (author)
  • Univ Nebraska, NE 68588 USAHalvledarmaterial (creator_code:org_t)

Related titles

  • In:Journal of Applied Physics: AMER INST PHYSICS124:110021-89791089-7550

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