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Dense Ti0.67Hf0.33B1.7 thin films grown by hybrid HfB2-HiPIMS/TiB2-DCMS co-sputtering without external heating
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- Bakhit, Babak, 1983- (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Mráz, Stanislav (author)
- Materials Chemistry, RWTH Aachen University, Aachen, Germany
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- Lu, Jun, 1962- (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- (creator_code:org_t)
- Elsevier, 2021
- 2021
- English.
- In: Vacuum. - : Elsevier. - 0042-207X .- 1879-2715. ; 186
- Journal article (peer-reviewed)
Abstract
Subject headings
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- There is a need for developing synthesis techniques that allow the growth of high-quality functional films at low substrate temperatures to minimize energy consumption and enable coating temperature-sensitive substrates. A typical shortcoming of conventional low-temperature growth strategies is insufficient atomic mobility, which leads to porous microstructures with impurity incorporation due to atmosphere exposure, and, in turn, poor mechanical properties. Here, we report the synthesis of dense Ti0.67Hf0.33B1.7 thin films with a hardness of ∼41.0 GPa grown without external heating (substrate temperature below ∼100 °C) by hybrid high-power impulse and dc magnetron co-sputtering (HfB2-HiPIMS/TiB2-DCMS) in pure Ar on Al2O3(0001) substrates. A substrate bias potential of −300 V is synchronized to the target-ion-rich portion of each HiPIMS pulse. The limited atomic mobility inherent to such desired low-temperature deposition is compensated for by heavy-mass ion (Hf+) irradiation promoting the growth of dense Ti0.67Hf0.33B1.7.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Materialteknik -- Keramteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering -- Ceramics (hsv//eng)
Keyword
- Thin films
- Borides
- Low-temperature sputter deposition
- Hybrid HiPIMS/DCMS
- Hardness
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- art (subject category)
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- Vacuum
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- Linköping University
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