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Influence of Si con...
Influence of Si content on phase stability and mechanical properties of TiAlSiN films grown by AlSi-HiPIMS/Ti-DCMS co-sputtering
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- Hsu, Tun-Wei, 1991- (author)
- Linköpings universitet,Nanostrukturerade material,Tekniska fakulteten
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- Greczynski, Grzegorz, 1973- (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Boyd, Robert, 1972- (author)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten
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- Kolozsvári, Szilárd (author)
- PLANSEE Composite Materials GmbH, Germany
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- Polcik, Peter (author)
- PLANSEE Composite Materials GmbH, Germany
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- Bolz, Stephan (author)
- CemeCon AG, Germany
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- Bakhit, Babak, 1983- (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Odén, Magnus, 1965- (author)
- Linköpings universitet,Nanostrukturerade material,Tekniska fakulteten
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(creator_code:org_t)
- Elsevier, 2021
- 2021
- English.
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In: Surface & Coatings Technology. - : Elsevier. - 0257-8972 .- 1879-3347. ; 427
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https://liu.diva-por... (primary) (Raw object)
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Abstract
Subject headings
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- Ti1-x(AlySi1-y)xN coatings covering a wide compositional range, 0.38 < x < 0.76 and 0.68 ≤ y ≤ 1.00, are deposited to investigate the influence of Al+/Si+ ion irradiation on microstructural and mechanical properties. The samples are grown in Ar/N2 atmosphere by the hybrid high-power impulse and dc magnetron co-sputtering (HiPIMS/DCMS) method with substrate bias synchronized to the Al+/Si+-rich portion of the HiPIMS pulses. Two Ti targets are operated in DCMS mode, while one AlSi target is operated in HiPIMS mode. Four different AlSi target compositions are used: Al1.0Si0.0, Al0.9Si0.1, Al0.8Si0.2, and Al0.6Si0.4. X-ray diffractometry reveals that films without Si (i.e., y = 1.0) have high Al solubility in NaCl-structure, c-TiAlN, up to x ≤ 0.67 no w-AlN is detected. Once Si (y < 1.0) is introduced the Al solubility limit decreases, but remains higher than other PVD techniques, along with grain refinement and the formation of a SiNz rich tissues phase, as shown by transmission electron microscopy. The nanoindentation hardness is high (~ 30 GPa) for all films that do not contain the w-AlN phase. All the coatings have compressive stresses lower than -3 GPa. Interestingly, a range of films with different compositions displayed both high hardness (~ 30 GPa) and low residual stress (σ < 0.5 GPa). Such an unique combination of properties highlights the benefits of using HiPIMS/DCMS configuration with metal-ion-synchronized substrate bias, which utilizes the Al+/Si+ supplantation effect and minimizes the Ar+ incorporation.
Subject headings
- NATURVETENSKAP -- Kemi -- Materialkemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Materials Chemistry (hsv//eng)
Keyword
- Thin films
- TiAlSiN
- Magnetron sputtering
- HiPIMS
- Al and Si irradiation
- Low stress
Publication and Content Type
- ref (subject category)
- art (subject category)
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Hsu, Tun-Wei, 19 ...
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Greczynski, Grze ...
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Boyd, Robert, 19 ...
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Kolozsvári, Szil ...
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Polcik, Peter
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Bolz, Stephan
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Bakhit, Babak, 1 ...
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Odén, Magnus, 19 ...
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- About the subject
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Chemical Science ...
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and Materials Chemis ...
- Articles in the publication
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Surface & Coatin ...
- By the university
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Linköping University