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Oxidation kinetics of overstoichiometric TiB2 thin films grown by DC magnetron sputtering
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- Dorri, Samira, 1988- (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Palisaitis, Justinas, 1983- (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Greczynski, Grzegorz, 1973- (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- (creator_code:org_t)
- Pergamon-Elsevier Science Ltd, 2022
- 2022
- English.
- In: Corrosion Science. - : Pergamon-Elsevier Science Ltd. - 0010-938X .- 1879-0496. ; 206
- Journal article (peer-reviewed)
Abstract
Subject headings
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- We systematically study the oxidation properties of sputter-deposited TiB2.5 coatings up to 700 °C. Oxide-scale thickness dox increases linearly with time ta for 300, 400, 500, and 700 °C, while an oxidation-protective behavior occurs with dox=250∙ta0.2 at 600 °C. Oxide-layer’s structure changes from amorphous to rutile/anatase-TiO2 at temperatures ≥ 500 °C. Abnormally low oxidation rate at 600 °C is attributed to a highly dense columnar TiO2-sublayer growing near oxide/film interface with a top-amorphous thin layer, suppressing oxygen diffusion. A model is proposed to explain the oxide-scale evolution at 600 °C. Decreasing heating rate to 1.0 °C/min plays a noticeable role in the TiB2.5 oxidation.
Subject headings
- NATURVETENSKAP -- Fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences (hsv//eng)
Keyword
- Sputtering
- Thin films
- Titanium diboride (TiB)
- Microstructure
- Oxidation
Publication and Content Type
- ref (subject category)
- art (subject category)
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