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  • Alijan Farzad Lahiji, FaezehLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten (author)

Unusual tilted growth and epitaxial relationship of NaCl B1-structured NiO and CrN on r-plane Al2O3

  • Article/chapterEnglish2024

Publisher, publication year, extent ...

  • American Institute of Physics Inc.2024
  • printrdacarrier

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  • LIBRIS-ID:oai:DiVA.org:liu-201578
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-201578URI
  • https://doi.org/10.1063/5.0188559DOI

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  • Language:English
  • Summary in:English

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  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

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  • Funding Agencies|Wallenberg Academy, (KAW-2020.0196); Linköpings Universitet, LiU, (2009 00971); Knut och Alice Wallenbergs Stiftelse; Vetenskapsrådet, VR, (2021-03826); Energimyndigheten, (46519-1)
  • Epitaxial NiO and CrN thin films were deposited on a single-crystal Al2O3(11¯02) (r-plane sapphire) using magnetron sputtering. The two materials were intentionally deposited into two different deposition chamber designs and under different conditions (temperature, pressure, gases, and energy of sputtered particles). Despite the differences in the deposition condition and material system, both materials had the same feature with uncommon tilted epitaxial growth. Through an in-depth x-ray diffraction analysis of the NaCl (B1)-structured materials on r-plane sapphire, the full twin domain epitaxial relations were determined and can be described as (110)NaCl(B1)∥(44¯03)Al2O3 and [11¯2]NaCl(B1)∥[1¯1¯20]Al2O3⁠. This relationship differs from the previously observed orientation of (100)NaCl(B1)∥(11¯02)Al2O3 and [100]NaCl(B1)∥[101¯0]Al2O3⁠. These results are of general relevance for the growth of the extended NaCl (B1)-structured cubic material family onto a r-plane sapphire substrate where similar epitaxial growth can be expected.

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  • Paul, BiplabLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)bippa36 (author)
  • Le Febvrier, ArnaudLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)arnle40 (author)
  • Eklund, PerLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)perek02 (author)
  • Linköpings universitetTunnfilmsfysik (creator_code:org_t)

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  • In:Journal of Applied Physics: American Institute of Physics Inc.135:60021-89791089-7550

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