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Dominant shallow acceptor related to oxygen and hydrogen in GaN

Monemar, Bo, 1942- (author)
Linköpings universitet,Tekniska högskolan,Halvledarmaterial
Paskov, Plamen, 1959- (author)
Linköpings universitet,Tekniska högskolan,Halvledarmaterial
Tuomisto, F. (author)
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Saarinen, K. (author)
Iwaya, M. (author)
Kamiyama, S. (author)
Amano, H. (author)
Akasaki, I. (author)
Kimura, S. (author)
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 (creator_code:org_t)
American Physical Society, 2006
2006
English.
In: Physical Review B. Condensed Matter and Materials Physics. - : American Physical Society. - 1098-0121 .- 1550-235X. ; 376-377, s. 440-443
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • We present new photoluminescence (PL) data of deliberately O-doped and Mg-doped GaN layers grown by MOCVD. The combination of these data with positron annihilation spectroscopy (PAS) and SIMS results obtained on the same samples shows a clear correlation of the PL intensity of the acceptor related emissions at 3.466 and 3.27 eV (at 2 K) with O doping. The acceptor is stable upon annealing in N-2 in our highly resistive samples, while it is known be unstable in p-GaN. Our tentative conclusion is that this very commonly occurring acceptor is either a V-Ga-O-H complex or a second configuration of the Mg acceptor containing H.

Keyword

GaN
hydrogen
oxygen
acceptor
NATURAL SCIENCES
NATURVETENSKAP

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