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Enhancement in elli...
Enhancement in ellipsometric thin film sensitivity near surface plasmon resonance conditions
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- Arwin, Hans, 1950- (author)
- Linköpings universitet,Tillämpad optik,Tekniska högskolan
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- Poksinski, Michal, 1976- (author)
- Linköpings universitet,Tillämpad optik,Tekniska högskolan
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- Johansen, Knut (author)
- Scientific Engineering QED, Linköping, Sweden
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(creator_code:org_t)
- Wiley-VCH Verlagsgesellschaft, 2008
- 2008
- English.
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In: Physica Status Solidi (a) applications and materials science. - : Wiley-VCH Verlagsgesellschaft. - 1862-6300 .- 1862-6319. ; 205:4, s. 817-820
- Related links:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Subject headings
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- Ellipsometry used in internal reflection mode exhibits enhanced thin film sensitivity if operated close to surface plasmon resonance conditions. Compared to conventional ellipsometry, the changes in the ellipsometric parameter Δ are several orders of magnitude larger. Here, the origin of this large sensitivity is discussed by analysing thin film approximations of the complex reflectance ratio. It is found that the thickness sensitivity in Δ is proportional to the inverse of the difference between the intrinsic and the radiation-induced damping of the surface plasmons.
Keyword
- NATURAL SCIENCES
- NATURVETENSKAP
Publication and Content Type
- ref (subject category)
- art (subject category)
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