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In-situ stress mea...
In-situ stress measurement during the deposition of CN x thin films by unbalanced magnetron sputtering; formation of high levels of stress with 28 eV ion irradiation
- Article/chapterEnglish2004
Publisher, publication year, extent ...
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Informa UK Limited,2004
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printrdacarrier
Numbers
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LIBRIS-ID:oai:DiVA.org:liu-45721
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https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-45721URI
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https://doi.org/10.1080/09500830410001716140DOI
Supplementary language notes
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Language:English
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Summary in:English
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Subject category:ref swepub-contenttype
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Subject category:art swepub-publicationtype
Notes
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Stress development during growth of CN x films by unbalanced magnetron sputtering has been investigated with an in-situ laser deflection technique. The stress is initially tensile, then it becomes compressive, reaching a maximum of as much as 7 GPa. These are anomalously high stress levels compared with pure carbon, considering the low ion energies (28 eV) and ion-to-neutral arrival rate ratio (<1) employed. This phenomenon is explained by the formation of a fullerene-like microstructure and nitrogen substitution at the growth surface. An accompanying increased reactivity of carbon atoms promotes sp3 bonding or other cross-linking of curved basal planes with resulting film densification.
Subject headings and genre
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TECHNOLOGY
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TEKNIKVETENSKAP
Added entries (persons, corporate bodies, meetings, titles ...)
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Pichon, L.Lab. de Mëtallurgie Physique, UMR 6630-CNRS, Téléport 2, Boulevard Pierre et Marie Curie, Chasseneuil Cédex, France
(author)
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Hellgren, N.Materials Research Laboratory, University of Illinois, 104 S. Goodwin Ave., Urbana, IL 61801, United States
(author)
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Czigany, ZsoltLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)zsocz82
(author)
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Neidhardt, JörgLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)jorne78
(author)
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Hultman, LarsLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)larhu75
(author)
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Lab. de Mëtallurgie Physique, UMR 6630-CNRS, Téléport 2, Boulevard Pierre et Marie Curie, Chasseneuil Cédex, FranceMaterials Research Laboratory, University of Illinois, 104 S. Goodwin Ave., Urbana, IL 61801, United States
(creator_code:org_t)
Related titles
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In:Philosophical Magazine Letters: Informa UK Limited84:6, s. 395-4030950-08391362-3036
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