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A solid phase reaction between Ti Cx thin films and Al2 O3 substrates
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- Persson, P.O.A. (author)
- Persson, P.O.Å., School of Physics, University of Sydney, NSW 2006, Australia
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- Rosen, Johanna (author)
- School of Physics, University of Sydney, NSW 2006, Australia
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- McKenzie, D.R. (author)
- School of Physics, University of Sydney, NSW 2006, Australia
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- Persson, PO.Å., School of Physics, University of Sydney, NSW 2006, Australia School of Physics, University of Sydney, NSW 2006, Australia (creator_code:org_t)
- AIP Publishing, 2008
- 2008
- English.
- In: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 103:6
- Journal article (peer-reviewed)
Abstract
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- Ti Cx thin films were deposited on Al2 O3 substrates at 900 °C by using a multiple cathode high current pulsed cathodic arc. The Ti:C pulse ratio and, hence, the composition was varied from C rich to Ti rich. It is found that the Al2 O3 substrate is decomposed and reacts with the Ti Cx film to incorporate significant amounts of O and Al in the growing film. When the stoichiometry is suitable, epitaxially oriented Ti2 AlC MAX phase with significant O incorporated is formed. The results indicate that Al2 O3 is not an ideal substrate material for the growth of transition metal carbides and MAX phase thin films. © 2008 American Institute of Physics.
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- TEKNIKVETENSKAP
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