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A solid phase react...
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Persson, P.O.A.Persson, P.O.Å., School of Physics, University of Sydney, NSW 2006, Australia
(author)
A solid phase reaction between Ti Cx thin films and Al2 O3 substrates
- Article/chapterEnglish2008
Publisher, publication year, extent ...
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AIP Publishing,2008
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printrdacarrier
Numbers
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LIBRIS-ID:oai:DiVA.org:liu-46444
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https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-46444URI
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https://doi.org/10.1063/1.2896637DOI
Supplementary language notes
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Language:English
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Summary in:English
Part of subdatabase
Classification
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Subject category:ref swepub-contenttype
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Subject category:art swepub-publicationtype
Notes
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Ti Cx thin films were deposited on Al2 O3 substrates at 900 °C by using a multiple cathode high current pulsed cathodic arc. The Ti:C pulse ratio and, hence, the composition was varied from C rich to Ti rich. It is found that the Al2 O3 substrate is decomposed and reacts with the Ti Cx film to incorporate significant amounts of O and Al in the growing film. When the stoichiometry is suitable, epitaxially oriented Ti2 AlC MAX phase with significant O incorporated is formed. The results indicate that Al2 O3 is not an ideal substrate material for the growth of transition metal carbides and MAX phase thin films. © 2008 American Institute of Physics.
Subject headings and genre
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TECHNOLOGY
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TEKNIKVETENSKAP
Added entries (persons, corporate bodies, meetings, titles ...)
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Rosen, JohannaSchool of Physics, University of Sydney, NSW 2006, Australia(Swepub:liu)johro07
(author)
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McKenzie, D.R.School of Physics, University of Sydney, NSW 2006, Australia
(author)
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Bilek, M.M.M.School of Physics, University of Sydney, NSW 2006, Australia
(author)
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Höglund, CarinaLinköpings universitet,Tekniska högskolan,Tunnfilmsfysik(Swepub:liu)carho79
(author)
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Persson, P.O.Å., School of Physics, University of Sydney, NSW 2006, AustraliaSchool of Physics, University of Sydney, NSW 2006, Australia
(creator_code:org_t)
Related titles
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In:Journal of Applied Physics: AIP Publishing103:60021-89791089-7550
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