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Growth of CNx/BN :
Growth of CNx/BN : C multilayer films by magnetron sputtering
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Johansson, M P (author)
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Hellgren, N. (author)
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- Berlind, Torun (author)
- Linköpings universitet,Tekniska högskolan,Tillämpad optik
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Broitman, E. (author)
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- Hultman, Lars (author)
- Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik
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Sundgren, J.-E. (author)
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(creator_code:org_t)
- 2000
- 2000
- English.
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In: Thin Solid Films. - 0040-6090 .- 1879-2731. ; 360:1-2, s. 17-23
- Related links:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Subject headings
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- Symmetric CNx/BN:C multilayer thin films, with nominal compositional modulation periods of ? = 2.5, 5, and 9 nm were deposited by unbalanced dual cathode magnetron sputtering from C (graphite) and B4C targets in an Ar/N2 (60/40) discharge. The multilayers and single-layer of the constituent CNx and BN:C compounds were grown to a total thickness of 0.5 µm onto Si(001) substrates held at 225°C and a negative floating potential of approx. 30 V (Ei = 24 eV). Layer characterizations were performed by TEM, X-ray reflectivity, RBS, and nanoindentation measurements. Results show that CN0.33 and BN:C (35, 50, and 15 at.% of B, N, and C, respectively) layers were prepared at the above conditions. It is suggested that all films exhibit a three-dimensional interlocked structure with a cylindrical texture in the film growth direction. The structure was continuous over relatively well defined and smooth CNx/BN:C interfaces. All coatings exhibit extreme elasticity with elastic recoveries as high as 85-90% (10 mN maximum load) attributed to the observed structure. However, the multilayers were stiffer and more elastic compared to that of the single-layers and thus shows promise for improved protective properties.
Keyword
- TECHNOLOGY
- TEKNIKVETENSKAP
Publication and Content Type
- ref (subject category)
- art (subject category)
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