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Characteristics of Ni Schottky contacts on compensated 4H-SiC layers

Kasamakova-Kolaklieva, L (author)
Yakimova, Rositsa (author)
Linköpings universitet,Tekniska högskolan,Halvledarmaterial
Kakanakov, R (author)
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Kakanakova-Georgieva, Anelia, 1970- (author)
Linköpings universitet,Tekniska högskolan,Halvledarmaterial
Syväjärvi, Mikael (author)
Linköpings universitet,Tekniska högskolan,Halvledarmaterial
Janzén, Erik (author)
Linköpings universitet,Tekniska högskolan,Halvledarmaterial
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 (creator_code:org_t)
Trans Tech Publications, 2003
2003
English.
In: Materials Science Forum, Vols. 433-436. - : Trans Tech Publications. ; , s. 709-712
  • Conference paper (peer-reviewed)
Abstract Subject headings
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  • The electrical properties of Ni Schottky contacts to compensated 4H-SiC layers have been characterized by means of IN and C-V measurements and the key parameters have been determined. The measured barrier heights were between 0.90 eV and 2.90 eV depending on the conductivity type and the donor/acceptor concentration as well as the measurement techniques used. Inhomogeneties in IN characteristics of some rectifiers at lower forward-bias voltages have been observed. This may suggest enhanced trapping mechanism due to the nonuniform boron compensation of the epilayers.

Keyword

epilayer compensation
recombination
Schottky contacts
thermionic emission
TECHNOLOGY
TEKNIKVETENSKAP

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ref (subject category)
kon (subject category)

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