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Characteristics of ...
Characteristics of Ni Schottky contacts on compensated 4H-SiC layers
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Kasamakova-Kolaklieva, L (author)
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- Yakimova, Rositsa (author)
- Linköpings universitet,Tekniska högskolan,Halvledarmaterial
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Kakanakov, R (author)
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- Kakanakova-Georgieva, Anelia, 1970- (author)
- Linköpings universitet,Tekniska högskolan,Halvledarmaterial
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- Syväjärvi, Mikael (author)
- Linköpings universitet,Tekniska högskolan,Halvledarmaterial
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- Janzén, Erik (author)
- Linköpings universitet,Tekniska högskolan,Halvledarmaterial
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(creator_code:org_t)
- Trans Tech Publications, 2003
- 2003
- English.
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In: Materials Science Forum, Vols. 433-436. - : Trans Tech Publications. ; , s. 709-712
- Related links:
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https://urn.kb.se/re...
Abstract
Subject headings
Close
- The electrical properties of Ni Schottky contacts to compensated 4H-SiC layers have been characterized by means of IN and C-V measurements and the key parameters have been determined. The measured barrier heights were between 0.90 eV and 2.90 eV depending on the conductivity type and the donor/acceptor concentration as well as the measurement techniques used. Inhomogeneties in IN characteristics of some rectifiers at lower forward-bias voltages have been observed. This may suggest enhanced trapping mechanism due to the nonuniform boron compensation of the epilayers.
Keyword
- epilayer compensation
- recombination
- Schottky contacts
- thermionic emission
- TECHNOLOGY
- TEKNIKVETENSKAP
Publication and Content Type
- ref (subject category)
- kon (subject category)
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