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Electrical peculiarities in Al/Si/Ge/... /Ge/Si and Al/SiGe/Si structures

Horvath, ZJ (author)
Hungarian Acad Sci, Res Inst Tech Phys & Mat Sci, H-1525 Budapest 114, Hungary Linkoping Univ, Dept Phys, S-58183 Linkoping, Sweden
Järrendahl, Kenneth (author)
Linköpings universitet,Tekniska högskolan
Adam, M (author)
Hungarian Acad Sci, Res Inst Tech Phys & Mat Sci, H-1525 Budapest 114, Hungary Linkoping Univ, Dept Phys, S-58183 Linkoping, Sweden
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Szabo, I (author)
Hungarian Acad Sci, Res Inst Tech Phys & Mat Sci, H-1525 Budapest 114, Hungary Linkoping Univ, Dept Phys, S-58183 Linkoping, Sweden
Van Tuyen, V (author)
Hungarian Acad Sci, Res Inst Tech Phys & Mat Sci, H-1525 Budapest 114, Hungary Linkoping Univ, Dept Phys, S-58183 Linkoping, Sweden
Czigany, Z (author)
Hungarian Acad Sci, Res Inst Tech Phys & Mat Sci, H-1525 Budapest 114, Hungary Linkoping Univ, Dept Phys, S-58183 Linkoping, Sweden
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 (creator_code:org_t)
2002
2002
English.
In: Applied Surface Science. - 0169-4332 .- 1873-5584. ; 190:1-4, s. 403-407
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • The current-voltage (I-V) and capacitance-voltage (C-V) behaviour of different Si/Ge multilayers and SiGe single layers prepared on p-type Si substrates by magnetron sputtering and annealing, has been studied in the temperature rang, of 80-320 K by using Al Schottky contacts as test structures. Although a significant influence of the microstructure of the Si/Ge multilayers and SiGe layers was obtained on the electrical behaviour of the structures, the structures exhibited similar specific features. (C) 2002 Elsevier Science B.V. All rights reserved.

Keyword

Si
SiGe
Schottky barrier
superlattice
amorphous
electrical behaviour
TECHNOLOGY
TEKNIKVETENSKAP

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ref (subject category)
art (subject category)

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