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Thermal stability and mechanical properties of arc evaporated ZrN/ZrAlN multilayers
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- Rogström, Lina (author)
- Linköpings universitet,Nanostrukturerade material,Tekniska högskolan
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- Johnson, Lars (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Johansson, Mats (author)
- SECO Tools AB, Fagersta
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- Elsevier, 2010
- 2010
- English.
- In: Thin Solid Films. - : Elsevier. - 0040-6090 .- 1879-2731. ; 519:2, s. 694-699
- Journal article (peer-reviewed)
Abstract
Subject headings
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- ZrN1.20/Zr0.44Al0.56N1.20 multilayer films as well as ZrN1.17 and Zr0.44Al0.56N1.20 films were deposited by reactive arc evaporation on WC–Co substrates. Samples were post-deposition annealed for 2 h at 800–1200 °C. As-deposited and heat treated films were characterized by scanning transmission electron microscopy, X-ray diffraction and nanoindentation. The thermal stability was studied using a combination of differential scanning calorimetry, thermogravimetry, and mass spectrometry. The as-deposited Zr0.44Al0.56N1.20 film exhibits a nanocomposite structure of cubic and wurtzite ZrAlN. During annealing, the formation of ZrN- and AlN-rich domains results in age hardening of both the Zr0.44Al0.56N1.20 and the ZrN/ZrAlN multilayers. The age hardening is enhanced in the ZrN/ZrAlN multilayer due to straining of the ZrAlN sublayers in which a maximum hardness of 31 GPa is obtained after annealing at 1100 °C.
Keyword
- Thin films; Zr-Al-N; Multilayer; Arc evaporation; TEM; Hardness
- NATURAL SCIENCES
- NATURVETENSKAP
Publication and Content Type
- ref (subject category)
- art (subject category)
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- Rogström, Lina
- Johnson, Lars
- Johansson, Mats
- Ahlgren, Mats
- Hultman, Lars
- Odén, Magnus
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- Thin Solid Films
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- Linköping University
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