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  • Dagnelund, DanielLinköpings universitet,Funktionella elektroniska material,Tekniska högskolan (author)

Effects of hydrogenation on non-radiative defects in GaNP and GaNAs alloys: An optically detected magnetic resonance study

  • Article/chapterEnglish2012

Publisher, publication year, extent ...

  • American Institute of Physics (AIP),2012
  • electronicrdacarrier

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  • LIBRIS-ID:oai:DiVA.org:liu-74675
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-74675URI
  • https://doi.org/10.1063/1.3676576DOI

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  • Language:English
  • Summary in:English

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  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

Notes

  • funding agencies|Swedish Research Council| 621-2010-3815 |Swedish Institute||
  • Photoluminescence and optically detected magnetic resonance techniques are utilized to study defect properties of GaNP and GaNAs alloys subjected to post-growth hydrogenation by low-energy sub-threshold ion beam irradiation. It is found that in GaNP H incorporation leads to activation of new defects, which has a Ga interstitial (Ga-i) atom at its core and may also involve a H atom as a partner. The observed activation critically depends on the presence of N in the alloy, as it does not occur in GaP with a low level of N doping. In sharp contrast, in GaNAs hydrogen is found to efficiently passivate Ga-i-related defects present in the as-grown material. A possible mechanism responsible for the observed difference in the H behavior in GaNP and GaNAs is discussed.

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Added entries (persons, corporate bodies, meetings, titles ...)

  • Vorona, I.P.Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Kiev, Ukraine (author)
  • Nosenko, G.Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Kiev, Ukraine (author)
  • Wang, X. J.National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, China (author)
  • Tu, C. W.Department of Electrical and Computer Engineering, University of California, San Diego, La Jolla, California, USA (author)
  • Yonezu, H.Department of Electrical and Electronic Engineering, Toyohashi University of Technology, Japan (author)
  • Polimeni, A.INFM and Dipartimento di Fisica, Università di Roma “La Sapienza”, Roma, Italy (author)
  • Capizzi, M.INFM and Dipartimento di Fisica, Universita` di Roma “La Sapienza”, Piazzale A. Moro 2, (author)
  • Chen, WeiminLinköpings universitet,Funktionella elektroniska material,Tekniska högskolan(Swepub:liu)weich55 (author)
  • Buyanova, IrinaLinköpings universitet,Funktionella elektroniska material,Tekniska högskolan(Swepub:liu)iribo40 (author)
  • Linköpings universitetFunktionella elektroniska material (creator_code:org_t)

Related titles

  • In:Journal of Applied Physics: American Institute of Physics (AIP)111:0235010021-89791089-7550

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