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Growth of Hard Amor...
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Fager, HannaLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan
(author)
Growth of Hard Amorphous Ti-Al-Si-N Thin Films by Cathodic Arc Evaporation
- Article/chapterEnglish2013
Publisher, publication year, extent ...
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Elsevier BV,2013
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electronicrdacarrier
Numbers
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LIBRIS-ID:oai:DiVA.org:liu-80199
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https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-80199URI
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https://doi.org/10.1016/j.surfcoat.2013.07.014DOI
Supplementary language notes
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Language:English
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Summary in:English
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Classification
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Subject category:ref swepub-contenttype
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Subject category:art swepub-publicationtype
Notes
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Ti(1−x−y)AlxSiyNz (0.02≤x≤0.46, 0.02≤y≤0.28, and 1.08≤z≤1.29) thin films were grown on cemented carbide substrates in an industrial scale cathodic arc evaporation system using Ti-Al-Si compound cathodes in a N2 atmosphere. The microstructure of the as-deposited films changes from nanocrystalline to amorphous by addition of Al and Si to TiN. Upon incorporation of 12 at% Si and 18 at% Al, the films assume an x-ray amorphous state. Post-deposition anneals show that the films are thermally stable up to 900 ◦C. The films exhibit age hardening up to 1000 ◦C with an increase in hardness from 21.9 GPa for as-deposited films to 31.6 GPa at 1000 ◦C. At 1100 ◦C severe out-diffusion of Co and W from the substrate occur, and the films recrystallize into c-TiN and w-AlN.
Added entries (persons, corporate bodies, meetings, titles ...)
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Andersson, J. M.Seco Tools AB, SE-737 82 Fagersta, Sweden
(author)
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Johansson, MatsLinköpings universitet,Nanostrukturerade material,Tekniska högskolan(Swepub:liu)matjo02
(author)
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Odén, MagnusLinköpings universitet,Nanostrukturerade material,Tekniska högskolan(Swepub:liu)magod41
(author)
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Hultman, LarsLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)larhu75
(author)
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Linköpings universitetTunnfilmsfysik
(creator_code:org_t)
Related titles
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In:Surface & Coatings Technology: Elsevier BV235:25, s. 376-3850257-89721879-3347
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