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Photo-dissociation of hydrogen passivated dopants in gallium arsenide

Tong, Longyu (author)
National Microelectronics Research Centre (NMRC), University College, Lee Maltings, Prospect Row, Cork
Larsson, Andreas (author)
Nolan, Michael (author)
National Microelectronics Research Centre (NMRC), University College, Lee Maltings, Prospect Row, Cork
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Murtagh, MArtin E. (author)
National Microelectronics Research Centre (NMRC), University College, Lee Maltings, Prospect Row, Cork
Greer, James C. (author)
National Microelectronics Research Centre (NMRC), University College, Lee Maltings, Prospect Row, Cork
Barbe, Michel (author)
Laboratoire de Physique des Solides et de Cristallogénèse, CNRS, 1 Place A. Briand, 92195 Meudon Cedex
Bailly, Francis (author)
Laboratoire de Physique des Solides et de Cristallogénèse, CNRS, 1 Place A. Briand, 92195 Meudon Cedex
Chevallier, Jacques (author)
Laboratoire de Physique des Solides et de Cristallogénèse, CNRS, 1 Place A. Briand, 92195 Meudon Cedex
Silvestre, F.S. (author)
IEMN, UMR CNRS 9929, BP69, Avenue Poincaré, 59652 Villeneuve d'Ascq Cedex
Loridant-Bernard, D. (author)
IEMN, UMR CNRS 9929, BP69, Avenue Poincaré, 59652 Villeneuve d'Ascq Cedex
Constant, E. (author)
IEMN, UMR CNRS 9929, BP69, Avenue Poincaré, 59652 Villeneuve d'Ascq Cedex
Constant, F.M. (author)
Laboratoire de Spectrochimie Infrarouge et Raman, UPR2631L CNRS, Université des Sciences et Techniques de Lille
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National Microelectronics Research Centre (NMRC), University College, Lee Maltings, Prospect Row, Cork Laboratoire de Physique des Solides et de Cristallogénèse, CNRS, 1 Place A Briand, 92195 Meudon Cedex (creator_code:org_t)
2002
2002
English.
In: Nuclear Instruments and Methods in Physics Research Section B. - 0168-583X .- 1872-9584. ; 186:1-4, s. 234-239
  • Journal article (peer-reviewed)
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  • A theoretical and experimental study of the photo-dissociation mechanisms of hydrogen passivated n- and p-type dopants in gallium arsenide is presented. The photo-induced dissociation of the Si Ga-H complex has been observed for relatively low photon energies (3.48 eV), whereas the photo-dissociation of C As-H is not observed for photon energies up to 5.58 eV. This fundamental difference in the photo-dissociation behavior between the two dopants is explained in terms of the localized excitation energies about the Si-H and C-H bonds.

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