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Characterisation of...
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Hansson, B. A. M.KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden
(author)
Characterisation of a liquid-xenon jet laser-plasma extreme-ultraviolet source
- Article/chapterEnglish2004
Publisher, publication year, extent ...
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AIP Publishing,2004
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printrdacarrier
Numbers
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LIBRIS-ID:oai:DiVA.org:mdh-3118
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https://urn.kb.se/resolve?urn=urn:nbn:se:mdh:diva-3118URI
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https://doi.org/10.1063/1.1755441DOI
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https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-23472URI
Supplementary language notes
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Language:English
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Summary in:English
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Subject category:ref swepub-contenttype
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Subject category:art swepub-publicationtype
Notes
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Emmanuelle Janin is the birthname of Emmanuelle Göthelid.
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QC 20100525, QC 20111011
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A liquid-xenon-jet laser-plasma source for extreme-ultraviolet (EUV) and soft-x-ray generation has been characterized. Being a source candidate for EUV lithography (EUVL), we especially focus on parameters important for the integration of the source in EUVL systems. The deep-ultraviolet (DUV) out-of-band radiation (=120–400 nm) was quantified, to within a factor of two, using a flying-circus tool together with a transmission-grating spectrograph resulting in a total DUV conversion efficiency (CE) of ~0.33%/2sr. The size and the shape of the xenon plasma was investigated using an in-band-only EUV microscope, based on a spherical Mo/Si multilayer mirror and a charge-coupled device detector. Scalability of the source size from 20–270 µm full width at half maximum was shown. The maximum repetition-rate sustainable by the liquid-xenon-jet target was simulated by a double-pulse experiment indicating feasibility of >17 kHz operation. The xenon-ion energy distribution from the plasma was determined in a time-of-flight experiment with a Faraday-cup detector showing the presence of multi-kilo-electron-volt ions. Sputtering of silicon witness plates exposed to the plasma was observed, while a xenon background of >1 mbar was shown to eliminate the sputtering. It is concluded that the source has potential to meet the requirements of future EUVL systems.
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Added entries (persons, corporate bodies, meetings, titles ...)
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Hemberg, O.KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden(Swepub:kth)u16lyvg0
(author)
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Hertz, Hans M.KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden(Swepub:kth)u10uiefj
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Berglund, MagnusRoy. Inst. of Technology/Albanova, Sweden
(author)
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Choi, H. J.KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden(Swepub:kth)-
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Jacobsson, BjörnKTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden(Swepub:kth)u1bulnxl
(author)
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Janin, E.KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden(Swepub:kth)-
(author)
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Mosesson, SofiaKTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden(Swepub:kth)u1xrkwkm
(author)
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Rymell, L.KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden(Swepub:kth)-
(author)
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Thoresen, J.KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden(Swepub:kth)-
(author)
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Wilner, M.KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden(Swepub:kth)-
(author)
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KTHFysik
(creator_code:org_t)
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In:Review of Scientific Instruments: AIP Publishing75:6, s. 2122-21290034-67481089-7623
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Hansson, B. A. M ...
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Hemberg, O.
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Hertz, Hans M.
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Berglund, Magnus
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Choi, H. J.
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Jacobsson, Björn
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Janin, E.
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Mosesson, Sofia
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Rymell, L.
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Thoresen, J.
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Wilner, M.
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- About the subject
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Physical Science ...
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and Fusion Plasma an ...
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Physical Science ...
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Mälardalen University
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Royal Institute of Technology