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Improved step edges...
Improved step edges on LaAlO3 substrates by using amorphous carbon etch masks
- Article/chapterEnglish1994
Publisher, publication year, extent ...
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AIP Publishing,1994
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printrdacarrier
Numbers
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LIBRIS-ID:oai:DiVA.org:miun-9857
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https://urn.kb.se/resolve?urn=urn:nbn:se:miun:diva-9857URI
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https://doi.org/10.1063/1.112138DOI
Supplementary language notes
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Language:English
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Summary in:English
Part of subdatabase
Classification
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Subject category:ref swepub-contenttype
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Subject category:art swepub-publicationtype
Notes
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We report a technique for the fabrication of sharp and straight step edges on LaAlO3 (LAO) substrates by ion milling. An electron beam lithography defined amorphous carbon film was used as an etch mask. It had very low ion milling rate and was easily prepared and removed. Atomic force microscopy was used to determine the step profile. YBa2Cu3O7 step edge junctions fabricated at the LAO steps show promising results. An IcRn product of 1 mV was obtained at 30 K. A Fraunhofer-like magnetic field dependence of Ic was obtained up to ±2 0. One weak link or possibly identical weak links in series for these step edge junctions were observed from the current-voltage (I-V) curves as well as from the magnetic field dependence of the I-V curves. Applied Physics Letters is copyrighted by The American Institute of Physics.
Subject headings and genre
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JUNCTIONS; SQUIDS
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NATURAL SCIENCES
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NATURVETENSKAP
Added entries (persons, corporate bodies, meetings, titles ...)
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Ivanov, Z G
(author)
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Winkler, D
(author)
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Zhang, Y M
(author)
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Olin, Håkan
(author)
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Larsson, P
(author)
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Claeson, T
(author)
Related titles
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In:Applied Physics Letters: AIP Publishing65, s. 1177-11790003-69511077-3118
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