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Pressure and temper...
Pressure and temperature dependence of GaN/AlGaN high electron mobility transistor based sensors on a sapphire membrane
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- Edwards, M.J. (author)
- University of Bath
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- Le Boulbar, E.D. (author)
- University of Bath
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- Vittoz, S. (author)
- TIMA Laboratory (UJF CNRS G-INP)
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- Vanko, G. (author)
- Slovak Academy of Sciences
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- Brinkfeldt, Klas (author)
- RISE,IVF
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- Rufer, L. (author)
- TIMA Laboratory (UJF CNRS G-INP)
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- Johander, Per (author)
- RISE,IVF
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- Lalinský, T. (author)
- Slovak Academy of Sciences
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- Bowen, C.R. (author)
- University of Bath
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- Allsopp, D.W.E. (author)
- University of Bath
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(creator_code:org_t)
- 2012-02-15
- 2012
- English.
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In: Physica Status Solidi (C) Current Topics in Solid State Physics. - : Wiley. - 1862-6351. ; 9, s. 960-963
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https://doi.org/10.1...
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Abstract
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- This paper reports a high pressure sensor based on a GaN/AlGaN High Electron Mobility Transistor (HEMT) that uses its 375 mm thick sapphire substrate to provide a robust base and enables device operation up to at least 60 bar (6 MPa). Transduction of changes in ambient pressure occurs via piezoelectric and pyroelectric effects on the channel conductance. The HEMTs were strategically placed along an 8 mm 2 GaN/AlGaN/GaN/sapphire chip; where the central 4 mm diameter behaves as a pressure sensitive 'drumskin'. The location of peak response lies in the HEMT at the geometric centre of the drumskin, demonstrated by the change in I DS when the pressure was increased from 0 to 60 bar. The response of six strategically placed HEMTs along the chip's surface, were compared to a finite element model to predict sensor behaviour. © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering (hsv//eng)
Keyword
- AlGaN/GaN
- HEMT
- Piezoelectricity
- Stress sensor
- Temperature
Publication and Content Type
- ref (subject category)
- art (subject category)
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- By the author/editor
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Edwards, M.J.
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Le Boulbar, E.D.
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Vittoz, S.
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Vanko, G.
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Brinkfeldt, Klas
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Rufer, L.
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show more...
-
Johander, Per
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Lalinský, T.
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Bowen, C.R.
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Allsopp, D.W.E.
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show less...
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- ENGINEERING AND TECHNOLOGY
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RISE