Direct current magnetron sputtering deposition of nanocomposite alumina – zirconia thin films

Trinh, David Huy, 1981- (author): Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan

Kubart, Tomas (author): Uppsala universitet,Fasta tillståndets elektronik,Department of Solid State Electronics, The Ångström Laboratory, Uppsala University, Uppsala, Sweden

Nyberg, Tomas (author): Uppsala universitet,Fasta tillståndets elektronik,Department of Solid State Electronics, The Ångström Laboratory, Uppsala University, Uppsala, Sweden

Ottosson, M (author): Department of Solid State Electronics, The Ångström Laboratory, Uppsala University, Uppsala, Sweden

Hultman, Lars (author): Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan

Högberg, Hans (author): Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan

(creator_code:org_t)

Elsevier BV, 2008
2008
English.
In: Thin Solid Films. - : Elsevier BV. - 0040-6090 .- 1879-2731. ; 516:23, s. 8352-8358

Related links:: http://urn.kb.se/res...; show more...; https://urn.kb.se/re...; https://doi.org/10.1...; https://urn.kb.se/re...; show less...

Abstract Subject headings

Mixed aluminium oxide-zirconium oxide thin solid films have been synthesized at similar to 300 degrees C by reactive direct current magnetron sputtering from two targets. Partial pressure control of the oxygen gas ensured stoichiometric films without compromising the deposition rate. The composition of the films ranged from pure alumina to pure zirconia as measured by X-ray photoelectron spectroscopy. Microstructural characterisation showed that the pure zirconium oxide films nucleated initially as the tetragonal zirconia phase, while the 100/010/001 textured monoclinic zirconia phase grew under steady-state conditions with a columnar structure. Addition of aluminiurn to similar to 3 at.% caused the formation of tetragonal zirconia in the films, while further additions led to an amorphous structure as governed by the alumina under the present kinetic limitations.

TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)

By the author/editor: Trinh, David Huy ...; Kubart, Tomas; Nyberg, Tomas; Ottosson, M; Hultman, Lars; Högberg, Hans

About the subject

ENGINEERING AND TECHNOLOGY: ENGINEERING AND ...; and Electrical Engin ...; and Other Electrical ...

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.