Heavy ion beam-based nano- and micro-structuring of TiO2 single crystals using self-assembled masks

• Fast heavy ion beam-based lithography using masks of self-assembled materials has been applied for transferring well-ordered nano- and micropatterns to rutile TiO2 single crystals. As the induced damage has a high etching selectivity the patterns can be developed in hydrofluoric acid with very high-contrast. Here we present resulting patterns when using a mask of self-ordered silica spheres. The obtained pattern are replicas of the mass distribution of the mask. In addition the shape and size of the regular structures depend on the applied ion energy and fluence. Direct modifications of the optical properties of TiO2 in a well-defined pattern are also presented. (c) 2008 Elsevier B.V. All rights reserved.

Subject headings

NATURVETENSKAP  -- Fysik -- Subatomär fysik (hsv//swe)

NATURAL SCIENCES  -- Physical Sciences -- Subatomic Physics (hsv//eng)

NATURVETENSKAP  -- Fysik (hsv//swe)

NATURAL SCIENCES  -- Physical Sciences (hsv//eng)

Keyword

TECHNOLOGY

TEKNIKVETENSKAP

Ion physics

Jonfysik

Ion Physics

Jonfysik

Physics

Publication and Content Type

ref (subject category)

art (subject category)