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Atomic layer deposi...
Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen
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Kukli, Kaupo (author)
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Aarik, Jaan (author)
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Aidla, Aleks (author)
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Jogi, Indrek (author)
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Arroval, Tonis (author)
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- Lu, Jun (author)
- Uppsala universitet,Tillämpad materialvetenskap
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Sajavaara, Timo (author)
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Laitinen, Mikko (author)
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Kiisler, Alma-Asta (author)
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Ritala, Mikko (author)
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Leskela, Markku (author)
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Peck, John (author)
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Natwora, Jim (author)
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Geary, Joan (author)
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Spohn, Ronald (author)
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Meiere, Scott (author)
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Thompson, David M. (author)
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(creator_code:org_t)
- Elsevier BV, 2012
- 2012
- English.
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In: Thin Solid Films. - : Elsevier BV. - 0040-6090 .- 1879-2731. ; 520:7, s. 2756-2763
- Related links:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Subject headings
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- Ru thin films were grown on hydrogen terminated Si, SiO2, Al2O3, HfO2, and TiO2 surfaces by atomic layer deposition from bis(2,5-dimethylpyrrolyl)ruthenium precursor and oxygen. The 4-20 nm thick films on these surfaces consisted of nanocrystalline hexagonal metallic ruthenium, regardless of the deposition temperature. At the lowest temperatures examined, 250-255 degrees C, the growth of the Ru films was favored on silicon, compared to the growth on Al2O3, TiO2 and HfO2. At higher temperatures the nucleation and growth of Ru became enhanced in particular on HfO2, compared to the process on silicon. At 320-325 degrees C, no growth occurred on Si-H and SiO2-covered silicon. Resistivity values down to 18 mu Omega.cm were obtained for ca. 10 nm thick Ru films.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering (hsv//eng)
Keyword
- Atomic layer deposition
- Metal films
- Ruthenium
- Engineering Science with specialization in Materials Science
- Teknisk fysik med inriktning mot materialvetenskap
Publication and Content Type
- ref (subject category)
- art (subject category)
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- By the author/editor
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Kukli, Kaupo
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Aarik, Jaan
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Aidla, Aleks
-
Jogi, Indrek
-
Arroval, Tonis
-
Lu, Jun
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show more...
-
Sajavaara, Timo
-
Laitinen, Mikko
-
Kiisler, Alma-As ...
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Ritala, Mikko
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Leskela, Markku
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Peck, John
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Natwora, Jim
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Geary, Joan
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Spohn, Ronald
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Meiere, Scott
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Thompson, David ...
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show less...
- About the subject
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Materials Engine ...
- Articles in the publication
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Thin Solid Films
- By the university
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Uppsala University