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Ultra low contact resistivities for CMOS beyond 10nm node
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- Zhen, Zhang, 1979- (author)
- Uppsala universitet,Fasta tillståndets elektronik
- Koswatt, S. (author)
- Bedell, S. (author)
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- Baraskar, A. (author)
- Guillorn, M. (author)
- Engelmann, S. (author)
- Zhu, Y. (author)
- Gonsalves, J. (author)
- Pyzyna, A. (author)
- Hopstaken, M. (author)
- Witt, C. (author)
- Yang, L. (author)
- Liu, F. (author)
- Newbury, J. (author)
- Song, W. (author)
- Cabral, C. (author)
- Lofaro, M. (author)
- Ozcan, A. (author)
- Raymond, M (author)
- Lavoie, C. (author)
- Sleight, J. (author)
- Rodbell, K. (author)
- Solomon, P. (author)
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- (creator_code:org_t)
- 2013
- 2013
- English.
- In: IEEE Electron Device Letters. - 0741-3106 .- 1558-0563. ; 34, s. 723-725
- Journal article (peer-reviewed)
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- Zhen, Zhang, 197 ...
- Koswatt, S.
- Bedell, S.
- Baraskar, A.
- Guillorn, M.
- Engelmann, S.
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- Zhu, Y.
- Gonsalves, J.
- Pyzyna, A.
- Hopstaken, M.
- Witt, C.
- Yang, L.
- Liu, F.
- Newbury, J.
- Song, W.
- Cabral, C.
- Lofaro, M.
- Ozcan, A.
- Raymond, M
- Lavoie, C.
- Sleight, J.
- Rodbell, K.
- Solomon, P.
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