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Helium ion backscattering analysis employed to study surface damage and contamination of RF sputter etched silicon
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- Hesselbom, H (author)
- Uppsala universitet,Fasta tillståndets elektronik
- (creator_code:org_t)
- 1978
- 1978
- English.
- In: Physica Scripta. - 0031-8949 .- 1402-4896. ; 18, s. 400-
- Journal article (peer-reviewed)
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