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Structural correlations at Si/Si3N4 interface and atomic stresses in Si/Si3N4 nanopixel-10 million-atom molecular dynamics simulation on parallel computers

Bachlechner, ME (author)
Uppsala universitet
Kalia, RK (author)
Uppsala universitet
Nakano, A (author)
Uppsala universitet
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Omeltchenko, A (author)
Uppsala universitet
Vashishta, P (author)
Uppsala universitet
Ebbsjo, I (author)
Uppsala universitet
Madhukar, A (author)
Uppsala universitet
Zhao, GL (author)
Uppsala universitet
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 (creator_code:org_t)
ELSEVIER SCI LTD, 1999
1999
English.
In: JOURNAL OF THE EUROPEAN CERAMIC SOCIETY. - : ELSEVIER SCI LTD. - 0955-2219. ; 19:13-14, s. 2265-2272
  • Journal article (other academic/artistic)
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  • We have combined first-principle calculations of charge transfer at the Si/Si3N4 interface with the interaction potential models for bulk Si and Si3N4 to produce a model for the Si/Si3N4 interface. Using these interatomic potentials, million atom molecula

Keyword

molecular dynamics; Si; Si3N4/Si interface; simulation; Si3N4; SILICON-NITRIDE; ELECTRONIC-STRUCTURE; MORPHOLOGY; STRAIN; FILMS; DEFECT

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vet (subject category)
art (subject category)

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