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Micromachining by ion track lithography
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- Thornell, Greger (author)
- Uppsala universitet,Institutionen för materialvetenskap,MATERIALS SCIENCE/MST
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- Spohr, R (author)
- Uppsala universitet,Institutionen för kärn- och partikelfysik
- van, Veldhuizen Elbert Jan (author)
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- Hjort, Klas (author)
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- (creator_code:org_t)
- ELSEVIER SCIENCE SA, 1999
- 1999
- English.
- In: SENSORS AND ACTUATORS A-PHYSICAL. - : ELSEVIER SCIENCE SA. - 0924-4247. ; 73:1-2, s. 176-183
- Journal article (peer-reviewed)
Abstract
Subject headings
Close
- Micromachining by ion track etching (MITE) based on the lithographic projection of a mask onto an arbitrary ion track recording material using a parallel beam of highly energetic heavy ions, is described here. By this, deep microstructures have been produ
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering (hsv//eng)
Keyword
- micromachining; lithography; etching
- Materials science
- Teknisk materialvetenskap
Publication and Content Type
- ref (subject category)
- art (subject category)
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