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HPPMS deposition fr...
HPPMS deposition from composite targets : Effect of two orders of magnitude target power density changes on the composition of sputtered Cr-Al-C thin films
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- Ruess, H. (author)
- Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany.
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- Baben, M. To (author)
- Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany.;GTT Technol, Kaiserstr 103, D-52134 Herzogenrath, Germany.
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- Mraz, S. (author)
- Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany.
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- Shang, L. (author)
- Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany.
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- Polcik, P. (author)
- Plansee Composite Mat GmbH, Siebenburgerstr 23, D-86963 Lechbruck, Germany.
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- Kolozsvari, S. (author)
- Plansee Composite Mat GmbH, Siebenburgerstr 23, D-86963 Lechbruck, Germany.
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- Hans, M. (author)
- Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany.
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- Primetzhofer, Daniel (author)
- Uppsala universitet,Tillämpad kärnfysik
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- Schneider, Jochen M. (author)
- Uppsala universitet,Tillämpad kärnfysik,Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany
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Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany.;GTT Technol, Kaiserstr 103, D-52134 Herzogenrath, Germany. (creator_code:org_t)
- PERGAMON-ELSEVIER SCIENCE LTD, 2017
- 2017
- English.
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In: Vacuum. - : PERGAMON-ELSEVIER SCIENCE LTD. - 0042-207X .- 1879-2715. ; 145, s. 285-289
- Related links:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Subject headings
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- The effect of target power density, substrate bias potential and substrate temperature on the thin film composition was studied. A Cr-Al-C composite target was sputtered utilizing direct current (DCMS: 2.3 W/cm(2)) and high power pulsed magnetron sputtering (HPPMS: 373 W/cm(2)) generators. At floating potential, all Cr-Al-C thin films showed similar compositions, independently of the applied target power density. However, as substrate bias potential was increased to -400 V, aluminum deficiencies by a factor of up to 1.6 for DCMS and 4.1 for HPPMS were obtained. Based on the measured ion currents at the substrate, preferential re-sputtering of Al is suggested to cause the dramatic Al depletion. As the substrate temperature was increased to 560 degrees C, the Al concentration was reduced by a factor of up to 1.9 compared to the room temperature deposition. This additional reduction may be rationalized by thermally induced desorption being active in addition to re-sputtering.
Subject headings
- NATURVETENSKAP -- Fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences (hsv//eng)
Keyword
- Thin films
- DCMS
- HPPMS
- Composite/compound target
- Target power density
- Substrate bias potential
Publication and Content Type
- ref (subject category)
- art (subject category)
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