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Insulator Materials for Interface Passivation of Cu(In,Ga)Se-2 Thin Films

Cunha, J. M. V. (author)
Int Iberian Nanotechnol Lab, P-4715330 Braga, Portugal
Fernandes, P. A. (author)
Univ Aveiro, I3N, P-3810193 Aveiro, Portugal;Int Iberian Nanotechnol Lab, P-4715330 Braga, Portugal;Inst Politecn Porto, Inst Super Engn Porto, Dept Fis, CIETI, P-4200072 Porto, Portugal
Hultqvist, Adam (author)
Uppsala universitet,Fasta tillståndets elektronik
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Teixeira, J. P. (author)
Univ Aveiro, I3N, P-3810193 Aveiro, Portugal;Univ Aveiro, Dept Fis, P-3810193 Aveiro, Portugal
Bose, S. (author)
Int Iberian Nanotechnol Lab, P-4715330 Braga, Portugal
Vermang, B. (author)
IMEC Partner Solliance, B-3001 Leuven, Belgium;Univ Hasselt Partner Solliance, B-3590 Diepenbeek, Belgium;IMOMEC Partner Solliance, B-3590 Diepenbeek, Belgium
Garud, S. (author)
IMEC Partner Solliance, B-3001 Leuven, Belgium;Univ Hasselt Partner Solliance, B-3590 Diepenbeek, Belgium;IMOMEC Partner Solliance, B-3590 Diepenbeek, Belgium
Buldu, D. (author)
IMEC Partner Solliance, B-3001 Leuven, Belgium;Univ Hasselt Partner Solliance, B-3590 Diepenbeek, Belgium;IMOMEC Partner Solliance, B-3590 Diepenbeek, Belgium
Gaspar, J. (author)
Int Iberian Nanotechnol Lab, P-4715330 Braga, Portugal
Edoff, Marika, 1965- (author)
Uppsala universitet,Fasta tillståndets elektronik
Leitao, J. P. (author)
Univ Aveiro, I3N, P-3810193 Aveiro, Portugal;Univ Aveiro, Dept Fis, P-3810193 Aveiro, Portugal
Salome, P. M. P. (author)
Int Iberian Nanotechnol Lab, P-4715330 Braga, Portugal;Univ Aveiro, Dept Fis, P-3810193 Aveiro, Portugal
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 (creator_code:org_t)
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 2018
2018
English.
In: IEEE Journal of Photovoltaics. - : IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC. - 2156-3381 .- 2156-3403. ; 8:5, s. 1313-1319
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • In this work, metal-insulator-semiconductor structures were fabricated in order to study different types of insulators, namely, aluminum oxide (Al2O3), silicon nitride, and silicon oxide (SiOx) to be used as passivation layers in Cu(In,Ga)Se-2 (CIGS) thin-film solar cells. The investigated stacks consisted of SLG/Mo/CIGS/insulator/Al. Raman scattering and photoluminescence measurements were done to verify the insulator deposition influence on the CIGS surface. In order to study the electrical properties of the CIGS-insulator interface, capacitance versus conductance and voltage (C-G-V) measurements were done to estimate the number and polarity of fixed insulator charges (Q(f)). The density of interface defects (D-it) was estimated from capacitance versus conductance and frequency (C-G-f) measurements. This study evidences that the deposition of the insulators at high temperatures (300 degrees C) and the use of a sputtering technique cause surface modification on the CIGS surface. We found that, by varying the SiOx deposition parameters, it is possible to have opposite charges inside the insulator, which would allow its use in different device architectures. The material with lower Dit values was Al2O3 when deposited by sputtering.

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
NATURVETENSKAP  -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
NATURAL SCIENCES  -- Physical Sciences -- Condensed Matter Physics (hsv//eng)

Keyword

Chemical passivation
Cu(In
Ga)Se-2 (CIGS)
field-effect passivation
interface
passivation
solar cells
thin films

Publication and Content Type

ref (subject category)
art (subject category)

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