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  • Klipfel, NadjaEcole Polytech Fed Lausanne EPFL Valais Wallis, Inst Chem Sci & Engn, Grp Mol Engn Funct Mat, CH-1951 Sion, Switzerland. (author)

Mechanistic Insights into the Role of the Bis(trifluoromethanesulfonyl) imide Ion in Coevaporated p-i-n Perovskite Solar Cells

  • Article/chapterEnglish2021

Publisher, publication year, extent ...

  • 2021-10-27
  • American Chemical Society (ACS),2021
  • printrdacarrier

Numbers

  • LIBRIS-ID:oai:DiVA.org:uu-461981
  • https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-461981URI
  • https://doi.org/10.1021/acsami.1c10117DOI

Supplementary language notes

  • Language:English
  • Summary in:English

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  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

Notes

  • Hybrid lead halide perovskites have reached comparable efficiencies to state-of-the-art silicon solar cell technologies. However, a remaining key challenge toward commercialization is the resolution of the perovskite device instability. In this work, we identify for the first time the mobile nature of bis-(trifluoromethanesulfonyl)imide (TFSI-), a typical anion extensively employed in p-type dopants for 2,2'7,7'-tetrakis(N,N-di-p-methoxyphenylamine)-9,9'spirofluorene (spiro-OMeTAD). We demonstrate that TFSI- can migrate through the perovskite layer via the grain boundaries and accumulate at the perovskite/electrontransporting layer (ETL) interface. Our findings reveal that the migration of TFSI- enhances the device performance and stability, resulting in highly stable p-i-n cells that retain 90% of their initial performance after 1600 h of continuous testing. Our systematic study, which targeted the effect of the nature of the dopant and its concentration, also shows that TFSI- acts as a dynamic defect-healing agent, which self-passivates the perovskite crystal defects during the migration process and thereby decreases nonradiative recombination pathways.

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  • Kanda, HiroyukiEcole Polytech Fed Lausanne EPFL Valais Wallis, Inst Chem Sci & Engn, Grp Mol Engn Funct Mat, CH-1951 Sion, Switzerland. (author)
  • Sutanto, Albertus AdrianEcole Polytech Fed Lausanne EPFL Valais Wallis, Inst Chem Sci & Engn, Grp Mol Engn Funct Mat, CH-1951 Sion, Switzerland. (author)
  • Mensi, MounirEcole Polytech Fed Lausanne EPFL Valais Wallis, Inst Chem Sci & Engn, Grp Mol Engn Funct Mat, CH-1951 Sion, Switzerland. (author)
  • Igci, CansuEcole Polytech Fed Lausanne EPFL Valais Wallis, Inst Chem Sci & Engn, Grp Mol Engn Funct Mat, CH-1951 Sion, Switzerland. (author)
  • Leifer, Klaus,1965-Uppsala universitet,Tillämpad materialvetenskap,Ecole Polytech Fed Lausanne EPFL Valais Wallis, Inst Chem Sci & Engn, Grp Mol Engn Funct Mat, CH-1951 Sion, Switzerland.(Swepub:uu)kllei839 (author)
  • Brooks, KeithEcole Polytech Fed Lausanne EPFL Valais Wallis, Inst Chem Sci & Engn, Grp Mol Engn Funct Mat, CH-1951 Sion, Switzerland. (author)
  • Kinge, SachinToyota Motor Co Ltd, Adv Technol Div, Toyota Motor Tech Ctr, B-1930 Zaventem, Belgium. (author)
  • Roldan-Carmona, CristinaEcole Polytech Fed Lausanne EPFL Valais Wallis, Inst Chem Sci & Engn, Grp Mol Engn Funct Mat, CH-1951 Sion, Switzerland.;Univ Valencia, Inst Ciencia Mol ICMol, C-J Beltran 2, Paterna 46980, Spain. (author)
  • Momblona, CristinaEcole Polytech Fed Lausanne EPFL Valais Wallis, Inst Chem Sci & Engn, Grp Mol Engn Funct Mat, CH-1951 Sion, Switzerland. (author)
  • Dyson, Paul J.Ecole Polytech Fed Lausanne EPFL Valais Wallis, Inst Chem Sci & Engn, Grp Mol Engn Funct Mat, CH-1951 Sion, Switzerland. (author)
  • Nazeeruddin, Mohammad KhajaEcole Polytech Fed Lausanne EPFL Valais Wallis, Inst Chem Sci & Engn, Grp Mol Engn Funct Mat, CH-1951 Sion, Switzerland. (author)
  • Ecole Polytech Fed Lausanne EPFL Valais Wallis, Inst Chem Sci & Engn, Grp Mol Engn Funct Mat, CH-1951 Sion, Switzerland.Tillämpad materialvetenskap (creator_code:org_t)

Related titles

  • In:ACS Applied Materials and Interfaces: American Chemical Society (ACS)13:44, s. 52450-524601944-82441944-8252

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