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Monolayer calibrati...
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Lee, Wei ChuangUniv Zurich, Phys Inst, CH-8057 Zurich, Switzerland.
(author)
Monolayer calibration of endofullerenes with x-ray absorption from implanted keV ion doses
- Article/chapterEnglish2024
Publisher, publication year, extent ...
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American Institute of Physics (AIP),2024
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LIBRIS-ID:oai:DiVA.org:uu-527894
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https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-527894URI
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https://doi.org/10.1116/6.0003302DOI
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Language:English
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Summary in:English
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Subject category:ref swepub-contenttype
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Subject category:art swepub-publicationtype
Notes
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X-ray absorption spectroscopy (XAS) has the highest sensitivity for chemical element detection on surfaces. With this approach, small amounts of lanthanide-containing endofullerene molecules (Ho3N@C80) have been measured by total electron yield at a low flux bending magnet beamline. The monolayer coverage is calibrated by extrapolating the signals of constant doses (3 x 1014 cm-2) of Ho ions implanted into SiO2 with energies between 2 and 115 keV. At room temperature, the Ho XAS spectra of the molecules and implanted ions indicate trivalent but not identical Ho ground states. Still, this approach demonstrates a way for calibration of small coverages of molecules containing open core-shell elements.
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Yu, LebinUniv Zurich, Phys Inst, CH-8057 Zurich, Switzerland.
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Oscarsson, Johan,1984-Uppsala universitet,Institutionen för fysik och astronomi(Swepub:uu)johos804
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Ochapski, Michal W.Ist Italiano Tecnol, Graphene Labs, IT-16163 Genoa, Italy.
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Sagehashi, RyunosukeUniv Zurich, Phys Inst, CH-8057 Zurich, Switzerland.
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Zhang, YangLeibniz Inst Solid State & Mat Res IFW, D-01069 Dresden, Germany.
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Popov, Alexey A.Leibniz Inst Solid State & Mat Res IFW, D-01069 Dresden, Germany.
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Gebeyehu, Zewdu M.Ist Italiano Tecnol, Graphene Labs, IT-16163 Genoa, Italy.
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Martini, LeonardoIst Italiano Tecnol, Graphene Labs, IT-16163 Genoa, Italy.
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Forti, StivenIst Italiano Tecnol, Graphene Labs, IT-16163 Genoa, Italy.
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Coletti, CamillaIst Italiano Tecnol, Graphene Labs, IT-16163 Genoa, Italy.
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Delley, BernardPaul Scherrer Inst PSI, Swiss Light Source, CH-5232 Villigen, Switzerland.
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Muntwiler, MatthiasPaul Scherrer Inst PSI, Swiss Light Source, CH-5232 Villigen, Switzerland.
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Primetzhofer, DanielUppsala universitet,Institutionen för fysik och astronomi(Swepub:uu)danpr521
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Greber, ThomasUniv Zurich, Phys Inst, CH-8057 Zurich, Switzerland.
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Univ Zurich, Phys Inst, CH-8057 Zurich, Switzerland.Institutionen för fysik och astronomi
(creator_code:org_t)
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In:Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films: American Institute of Physics (AIP)42:20734-21011520-8559
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Lee, Wei Chuang
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Yu, Lebin
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Oscarsson, Johan ...
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Ochapski, Michal ...
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Sagehashi, Ryuno ...
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Zhang, Yang
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Popov, Alexey A.
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Martini, Leonard ...
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Forti, Stiven
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Coletti, Camilla
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Delley, Bernard
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Muntwiler, Matth ...
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Primetzhofer, Da ...
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Greber, Thomas
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