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Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films

Ma, YJ (author)
Uppsala universitet
Yang, HN (author)
Uppsala universitet
Guo, J (author)
Uppsala universitet
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Sathe, C (author)
Uppsala universitet
Agui, A (author)
Uppsala universitet
Nordgren, J (author)
Uppsala universitet
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 (creator_code:org_t)
AMER INST PHYSICS, 1998
1998
English.
In: APPLIED PHYSICS LETTERS. - : AMER INST PHYSICS. - 0003-6951. ; 72:25, s. 3353-3355
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  • Fluorinated amorphous carbon (a-CFx) films were studied by high-resolution x-ray absorption, emission, and photoelectron spectroscopy. The composition and local bonding information were obtained and correlated with substrate temperature during deposition.

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DIAMOND

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art (subject category)

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Ma, YJ
Yang, HN
Guo, J
Sathe, C
Agui, A
Nordgren, J
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APPLIED PHYSICS ...
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Uppsala University

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