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Effects of post-deposition annealing on the material characteristics of ultrathin HfO2 films on silicon
- Puthenkovilakam, R (author)
- Lin, Y-S (author)
- Choi, J (author)
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- Pianetta, P (author)
- Devine, D (author)
- Sendler, M (author)
- Chang, J P (author)
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- (creator_code:org_t)
- 2005
- 2005
- English.
- In: J Appl Phys. ; 97:2
- Journal article (peer-reviewed)
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- Puthenkovilakam, ...
- Lin, Y-S
- Choi, J
- Lu, Jun
- Blom, Hans-Olof
- Pianetta, P
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- Devine, D
- Sendler, M
- Chang, J P
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- J Appl Phys
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- Uppsala University
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