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Ellipsometry on sputter-deposited tin oxide films: optical constants versus stoichiometry, hydrogen content, and amount of electrochemically intercalated lithium
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- Isidorsson, J (author)
- Uppsala universitet,Institutionen för materialvetenskap
- Granqvist, CG (author)
- von, Rottkay K (author)
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- Rubin, M (author)
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- (creator_code:org_t)
- OPTICAL SOC AMER, 1998
- 1998
- English.
- In: APPLIED OPTICS. - : OPTICAL SOC AMER. - 0003-6935. ; 37:31, s. 7334-7341
- Journal article (peer-reviewed)
Abstract
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- Tin oxide thin films were deposited by reactive radio-frequency magnetron sputtering onto In2O3:Sn-coated and bare glass substrates. Optical constants in the 300-2500-nm wavelength range were determined by a combination of variable-angle spectroscopi
Keyword
- ATOMIC-FORCE MICROSCOPY; EFFECTIVE-MEDIUM MODELS; SPECTROSCOPIC ELLIPSOMETRY; TRANSPARENT ELECTRODES; SURFACE-ROUGHNESS; SN OXIDE; ELECTROCHROMISM; REFLECTANCE; CAPACITY; INDEXES
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- ref (subject category)
- art (subject category)
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- Isidorsson, J
- Granqvist, CG
- von, Rottkay K
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- Uppsala University
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