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IN-SITU MONITORING OF HFCVD DIAMOND GROWTH ON NICKEL USING SOFT-X-RAY EMISSION-SPECTROSCOPY

SKYTT, P (author)
Uppsala universitet
JOHANSSON, E (author)
Uppsala universitet
CARLSSON, JO (author)
Uppsala universitet
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WASSDAHL, N (author)
Uppsala universitet
NORDGREN, J (author)
Uppsala universitet
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 (creator_code:org_t)
PERGAMON-ELSEVIER SCIENCE LTD, 1995
1995
English.
In: VACUUM. - : PERGAMON-ELSEVIER SCIENCE LTD. - 0042-207X. ; 46:8-10, s. 1053-1054
  • Journal article (other academic/artistic)
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  • It is well known that by analysing the C-K-emission from low pressure grown diamond films that it is possible to extract information of the types of bonding present. A HFCVD reactor has been constructed which together with a small soft X-ray emission spec

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art (subject category)

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SKYTT, P
JOHANSSON, E
CARLSSON, JO
WASSDAHL, N
NORDGREN, J
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VACUUM
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Uppsala University

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