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CVD of TiO2 on Si(111), SiOx/Si(111) and TiO2: Substrate and temperature dependence
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- Karlsson, P. G. (author)
- Uppsala universitet,Fysik I
- Richter, J. H. (author)
- Andersson, M. P. (author)
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- Blomquist, J. (author)
- Johansson, M. K.-J (author)
- Siegbahn, H. (author)
- Uvdal, P. (author)
- Sandell, A. (author)
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- Karlsson, P. G.
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- Uvdal, P.
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