ToF-SIMS depth profiling of (Ga,Mn)As capped with amorphous arsenic : effects of annealing time

• The influence of annealing time on an amorphous As cap layer and the depth distribution of Mn atoms have been investigated. The results show that a 1600 Å thick As cap layer is completely desorbed after 3 h of annealing time. The depth distributions of Mn indicate that interstitial Mn atoms have diffused to the outer surface and being passivated. The thickness of the Mn passivation layer was around 90 Å.

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Materialteknik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Materials Engineering (hsv//eng)

Keyword

ToF-SIMS; depth profiling; (Ga

Mn)As; As cap; Mn diffusion

Publication and Content Type

ref (subject category)

art (subject category)