Disordered Adsorbed Water Layers on TiO2 Nanoparticles under Subsaturated Humidity Conditions at 235 K

The interaction of water with TiO2 is of substantial scientific and technological interest as it determines the activity of TiO2 in photocatalytic and environmental applications in nanoparticle suspensions in water, in complex appliances, or in pure form interacting with water vapor. The influence of TiO2 nanoparticles on the hydrogen bonding structure of water molecules is an important factor that controls hydration of other species, reactions, or nucleation processes. We use a combination of ambient-pressure X-ray photoelectron spectroscopy and electron yield near-edge X-ray absorption fine structure (NEXAFS) spectroscopy at the oxygen K-edge to investigate the hydrogen bonding structure of adsorbed water on titania nanoparticles in equilibrium with nearly saturated water vapor at 235 K. The results clearly show that the net NEXAFS spectrum of adsorbed water resembles that of liquid, disordered water at 235 K, a temperature at which both homogeneous and heterogeneous freezing of bulk water is anticipated.

TEKNIK OCH TEKNOLOGIER Annan teknik Övrig annan teknik hsv//swe
ENGINEERING AND TECHNOLOGY Other Engineering and Technologies Other Engineering and Technologies not elsewhere specified hsv//eng
NATURVETENSKAP Kemi hsv//swe
NATURAL SCIENCES Chemical Sciences hsv//eng
x-ray-absorption
photoelectron-spectroscopy
surfaces
adsorption
xps
photocatalysis
mechanisms
nucleation
particles
air
Chemistry
Science & Technology - Other Topics
Materials Science
Physics

Artiglia, L. (author)
Yang, H. Y. (author)
Kong, XiangruiGothenburg University,Göteborgs universitet,Institutionen för kemi och molekylärbiologi,Department of Chemistry and Molecular Biology(Swepub:gu)xkonxi (author)
Roy, K. (author)
Waldner, A. (author)
Chen, S. Z. (author)
Bartels-Rausch, T. (author)
Ammann, M. (author)
Göteborgs universitetInstitutionen för kemi och molekylärbiologi (creator_code:org_t)

In:Journal of Physical Chemistry Letters: American Chemical Society (ACS)10:23, s. 7433-74381948-7185

By the author/editor: Orlando, F.; Artiglia, L.; Yang, H. Y.; Kong, Xiangrui; Roy, K.; Waldner, A.; show more...; Chen, S. Z.; Bartels-Rausch, ...; Ammann, M.; show less...

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